Breaking News
Comments
Newest First | Oldest First | Threaded View
lgadwah
User Rank
Rookie
re: Momentum builds for directed self-assembly
lgadwah   3/4/2011 7:39:37 PM
NO RATINGS
http://domino.research.ibm.com/comm/research_projects.nsf/pages/selfassembly.nxtalFLASH.html

krisi
User Rank
CEO
re: Momentum builds for directed self-assembly
krisi   3/4/2011 4:23:39 PM
NO RATINGS
Can direct sub-assembly find application in other areas of manufacturing beyond lithography? Kris

selinz
User Rank
CEO
re: Momentum builds for directed self-assembly
selinz   3/4/2011 4:31:05 AM
NO RATINGS
This sounds similar to the Langmuir blodgett films that IBM was working on in 1983... Cool stuff but it's been around quite a while.. Nice application though.

mcgrathdylan
User Rank
Blogger
re: Momentum builds for directed self-assembly
mcgrathdylan   3/3/2011 6:01:16 PM
NO RATINGS
@les_slater- paragraph 6 of the above article is my best attempt at explaining what I understand DSA to be in the simplest possible terms. I realize it probably falls short. I solicited this quote from Christopher Bencher of Applied Materials to describe what DSA is. I hope it helps: "Self assembly is a method of patterning using polymer phase-separation to generate features, typically less than 20nm, instead of relying solely on the classic mask projection into photo-resist. It has now established the first 300mm wafer defect density data point for directed self-assembly, and when plotted on historical defect density reduction roadmaps appears to be quite promising; the initial value is comparable to the immersion defect densities in its early years of commercialization. This result merits continued research and development for establishing directed self-assembly as a viable patterning technique for semiconductor manufacturing." -- Christopher Bencher, Applied Materials

double-o-nothing
User Rank
Rookie
re: Momentum builds for directed self-assembly
double-o-nothing   3/3/2011 3:08:40 PM
NO RATINGS
The number of self-assembled lines is too sensitive to the boundary size. A line could disappear if the boundary is a tad narrow.

Les_Slater
User Rank
CEO
re: Momentum builds for directed self-assembly
Les_Slater   3/3/2011 1:17:39 AM
NO RATINGS
K. Eric Wexler is of course, K. Eric Drexler.

Les_Slater
User Rank
CEO
re: Momentum builds for directed self-assembly
Les_Slater   3/3/2011 1:05:17 AM
NO RATINGS
The article talks about the potential of this technology and at what development stage it may be at but doesn’t explain what it is. It was the title of the article that brought me to read it. The implications are quite attractive. My first introduction to such concepts was at an MIT talk I attended in the late 80’s by K. Eric Wexler. What this present article is referring to does not seem to be related to his ‘universal assemblers’ though. That was a relief because the mechanism he suggested, engineering proteins for specific mechanical assembly tasks seems quite remote still. So, on this new ‘directed self-assembly’, the question arises, what is the mechanism of the direction? Looking around the web a bit I see there is talk of lithographic patterning and random deposition where capillary, electrostatic and van der Waals forces focus or sharpen the random deposition to conform to the lithographic pattern. Is this what we’re talking about here? Sounds exciting.

Les_Slater
User Rank
CEO
re: Momentum builds for directed self-assembly
Les_Slater   3/3/2011 1:03:13 AM
NO RATINGS
The article talks about the potential of this technology and at what development stage it may be at but doesn’t explain what it is. It was the title of the article that brought me to read it. The implications are quite attractive. My first introduction to such concepts was at an MIT talk I attended in the late 80’s by K. Eric Wexler. What this present article is referring to does not seem to be related to his ‘universal assemblers’ though. That was a relief because the mechanism he suggested, engineering proteins for specific mechanical assembly tasks seems quite remote still. So, on this new ‘directed self-assembly’, the question arises, what is the mechanism of the direction? Looking around the web a bit I see there is talk of lithographic patterning and random deposition where capillary, electrostatic and van der Waals forces focus or sharpen the random deposition to conform to the lithographic pattern. Is this what we’re talking about here? Sounds exciting.



EE Life
Frankenstein's Fix, Teardowns, Sideshows, Design Contests, Reader Content & More
Max Maxfield

Dr. Duino Diagnostic Shield Deduces Dilemmas in Arduino Shield Stacks
Max Maxfield
8 comments
As you are probably aware, I'm spending a lot of my free time creating Arduino-based projects, such as my Inamorata Prognostication Engine, my BADASS Display, and my Vetinari Clock.

EDN Staff

11 Summer Vacation Spots for Engineers
EDN Staff
20 comments
This collection of places from technology history, museums, and modern marvels is a roadmap for an engineering adventure that will take you around the world. Here are just a few spots ...

Glen Chenier

Engineers Solve Analog/Digital Problem, Invent Creative Expletives
Glen Chenier
15 comments
- An analog engineer and a digital engineer join forces, use their respective skills, and pull a few bunnies out of a hat to troubleshoot a system with which they are completely ...

Larry Desjardin

Engineers Should Study Finance: 5 Reasons Why
Larry Desjardin
46 comments
I'm a big proponent of engineers learning financial basics. Why? Because engineers are making decisions all the time, in multiple ways. Having a good financial understanding guides these ...

Flash Poll
Top Comments of the Week
Like Us on Facebook
EE Times on Twitter
EE Times Twitter Feed

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)