Tools that can inspect templates down to 24nm exist today. Yes, they are slow and based on ebeam, but they work.
Unlike EUV where we have pinned all our hopes on a currently fictitious 100W xray source.
Molecular Imprints produces both large area and step and repeat tools. There is no such thing as "full wafer imprint" for semiconductor applications because of registration. MI has the only semiconductor imprint tool and has also sold numerous large area imprint tools to disk drive produces for bit patterned media.