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BobbieSmith
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re: Imprint litho makes a good impression
BobbieSmith   3/4/2011 5:40:06 PM
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Tools that can inspect templates down to 24nm exist today. Yes, they are slow and based on ebeam, but they work. Unlike EUV where we have pinned all our hopes on a currently fictitious 100W xray source.

resistion
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re: Imprint litho makes a good impression
resistion   3/4/2011 4:44:58 PM
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No one has brought up the issue of template inspection.

Diogenes53
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re: Imprint litho makes a good impression
Diogenes53   3/4/2011 4:22:49 PM
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Molecular Imprints produces both large area and step and repeat tools. There is no such thing as "full wafer imprint" for semiconductor applications because of registration. MI has the only semiconductor imprint tool and has also sold numerous large area imprint tools to disk drive produces for bit patterned media.

double-o-nothing
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re: Imprint litho makes a good impression
double-o-nothing   3/4/2011 3:36:57 AM
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They are totally different. Obducat is full-wafer imprint, MII is step-and-imprint.

resistion
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re: Imprint litho makes a good impression
resistion   3/3/2011 2:08:33 AM
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Obducat is also popular for imprint. Are the technologies for Obducat and MII compatible for defining standards?



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As data rates begin to move beyond 25 Gbps channels, new problems arise. Getting to 50 Gbps channels might not be possible with the traditional NRZ (2-level) signaling. PAM4 lets data rates double with only a small increase in channel bandwidth by sending two bits per symbol. But, it brings new measurement and analysis problems. Signal integrity sage Ransom Stephens will explain how PAM4 differs from NRZ and what to expect in design, measurement, and signal analysis.

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