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resistion
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CEO
re: ASML claims progress in EUV
resistion   3/4/2011 2:29:55 AM
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There are many practiced tricks not related to litho tool to get logic minimum feature sizes smaller than the contemporary memory half-pitch.

double-o-nothing
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re: ASML claims progress in EUV
double-o-nothing   3/4/2011 3:16:09 AM
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3300B meant to have 22 nm resolution?

resistion
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CEO
re: ASML claims progress in EUV
resistion   3/4/2011 1:34:53 PM
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22 nm is what it is meant to be not 0.22 nm.

yalanand
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re: ASML claims progress in EUV
yalanand   3/4/2011 2:04:07 PM
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It is interesting to know that the throughput of the NXE tools is limited by the powersupply. What is the biggest challenge in scaling the power supply from 11w to 100w ?

Peter Clarke
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Blogger
re: ASML claims progress in EUV
Peter Clarke   3/4/2011 2:26:02 PM
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@yalanland. It is the power of the EUV light source that is the limiting factor. A couple of different types of source have been tried. As well as getting the source to shine that bright I believe that reliability and uptime is an issue. If you go brighter but have to take the machine down to faff around with the source for large periods of time the wafer throughput you gain during the uptime you more than lose in the downtime.

unknown multiplier
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re: ASML claims progress in EUV
unknown multiplier   3/6/2011 4:48:09 PM
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The fundamental problem is the EUV tool itself, even the source, absorbs EUV.

markmhel
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The processes
markmhel   4/10/2014 6:23:59 AM
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TO see could have that most for having it so clearly here which gives that way for more here. - Dr. Hicham Riba



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