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resistion
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re: MIT scientists claim 9-nm e-beam resolution
resistion   7/5/2011 2:16:36 AM
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The only thing I was impressed by was they could use few keV electrons, but the lithographic result is still too familiar, very rough lines and non-uniform dots in very thin resist. It is not a fault of the technique but a natural consequence of electrons being free to move after being released or injected in a film.

markhahn0
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re: MIT scientists claim 9-nm e-beam resolution
markhahn0   7/5/2011 2:54:24 AM
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I love the idea of "Extreme Ultraviolent UV" :)

resistion
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re: MIT scientists claim 9-nm e-beam resolution
resistion   7/5/2011 4:04:16 AM
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@markhahn: lol, good catch ;)

yalanand
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re: MIT scientists claim 9-nm e-beam resolution
yalanand   7/5/2011 4:41:25 AM
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Is resolution of 9nm possible from other other technologies like Photomask ? If answer is no then inspite of throughput issues e-beam resolution will become attractive.

resistion
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re: MIT scientists claim 9-nm e-beam resolution
resistion   7/5/2011 5:33:07 AM
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The abstract read that all structures with 15 nm hp and above were fully resolved, but smaller ones had some resist residues. 15 nm hp is also about the limit current demonstrated by spacer etching.

agk
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re: MIT scientists claim 9-nm e-beam resolution
agk   7/5/2011 8:13:46 AM
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To speed up the e-beam and make it more shaper reaching 9nm is excellent research and the scanning method instead of integral method made this win for the researchers.

double-o-nothing
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re: MIT scientists claim 9-nm e-beam resolution
double-o-nothing   7/5/2011 1:05:10 PM
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I think they will have problem with positive charging of the surface.

anon7584804
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re: MIT scientists claim 9-nm e-beam resolution
anon7584804   7/5/2011 3:34:15 PM
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go beam go.. thanks for opening doors for future & further

goafrit
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re: MIT scientists claim 9-nm e-beam resolution
goafrit   7/5/2011 9:16:34 PM
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I have no doubt provided it is from MIT. Those guys are awesome.

resistion
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CEO
re: MIT scientists claim 9-nm e-beam resolution
resistion   7/6/2011 11:04:06 AM
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Now it makes me wonder, why not use a SEM and low-k as resist?

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