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re: TSMC ready to flip the switch on EUV
krisi   9/8/2011 6:29:07 PM
Testing all 3 competing lithography techniques sounds like an expensive proposition. It probably also means that it is still unclear which one will move to manufacturing...Kris

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re: TSMC ready to flip the switch on EUV
GoViking   9/7/2011 6:49:52 PM
E-beam direct write...Long time coming!: I visited Bill Livesay at E-Beam Microfabrication (EBM) on Miramar Rd in San Diego in 1978, who was a pioneer in e-beam direct write; Howard Bogert published a newsletter in about 1980 for Dataquest, entitled, "E-Beam is Economic for Mask-Making". Maybe only the hard stop now faced by optical litho pushes e-beam to the forefront...or maybe not. We always have a way of extending the lifetime of 'inertial' technologies more than we ever imagined was possible.

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re: TSMC ready to flip the switch on EUV
resistion   9/6/2011 12:40:50 PM
To be fair, other companies have tried other NGLs besides EUV as well. Toshiba and Samsung have worked on imprint, IBM and Samsung worked on DSA. Long ago Intel, IBM tried xray.

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re: TSMC ready to flip the switch on EUV
resistion   9/6/2011 12:04:46 PM
Didn't hear much detail about the kla tool.

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