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resistion
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re: Darkhorse litho technologies stay in NGL race
resistion   2/18/2012 12:54:17 AM
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E-beam is more mature than optical for sure. But electrons, primary, photo-, or secondary, are prone to random disturbance. And they go into the substrate. So the interest in DSA, though it seems sensitive to the guiding pattern size.

rick merritt
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Author
re: Darkhorse litho technologies stay in NGL race
rick merritt   2/18/2012 2:13:45 AM
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I wonder if the co-existance of several litho techs will make the economics tougher (lower volumes for all).

Diogenes53
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Rookie
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:07:26 AM
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H

Diogenes53
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:16:20 AM
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The dream of e-beam direct write has been around as long as x-ray lithography, and just as successful. The e-beam problems of throughput, data management and error correction simply cannot be solved in time, or economically. EUV, or, more correctly, soft x-ray projection lithography, continues to suffer from very x-ray like problems of decades ago. The only technology with the potential to complement optical lithography is imprint, which essentially is optical lithography: it uses an I-line source, I-line resists, and quartz based photomasks. Defects are a more manageable challenge than those facing EBDW and SXPL (EUV), particularly in memory. Lithography will bifurcate into solutions for logic and solutions for memory.

Jason_Liu
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re: Darkhorse litho technologies stay in NGL race
Jason_Liu   2/19/2012 7:14:17 AM
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Perhaps, regarding as the viewpoint of mass-production, the approach to improve the common DOF of the different characteristics of pattern,ex. iso- vs. dense- ,or line vs. space, is more practical and economic than that to put all resource to enhance the resolution.

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