Breaking News
Comments
Newest First | Oldest First | Threaded View
Page 1 / 2   >   >>
Jason_Liu
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Jason_Liu   2/19/2012 7:14:17 AM
NO RATINGS
Perhaps, regarding as the viewpoint of mass-production, the approach to improve the common DOF of the different characteristics of pattern,ex. iso- vs. dense- ,or line vs. space, is more practical and economic than that to put all resource to enhance the resolution.

Diogenes53
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:16:20 AM
NO RATINGS
The dream of e-beam direct write has been around as long as x-ray lithography, and just as successful. The e-beam problems of throughput, data management and error correction simply cannot be solved in time, or economically. EUV, or, more correctly, soft x-ray projection lithography, continues to suffer from very x-ray like problems of decades ago. The only technology with the potential to complement optical lithography is imprint, which essentially is optical lithography: it uses an I-line source, I-line resists, and quartz based photomasks. Defects are a more manageable challenge than those facing EBDW and SXPL (EUV), particularly in memory. Lithography will bifurcate into solutions for logic and solutions for memory.

Diogenes53
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:07:26 AM
NO RATINGS
H

rick merritt
User Rank
Blogger
re: Darkhorse litho technologies stay in NGL race
rick merritt   2/18/2012 2:13:45 AM
NO RATINGS
I wonder if the co-existance of several litho techs will make the economics tougher (lower volumes for all).

resistion
User Rank
CEO
re: Darkhorse litho technologies stay in NGL race
resistion   2/18/2012 12:54:17 AM
NO RATINGS
E-beam is more mature than optical for sure. But electrons, primary, photo-, or secondary, are prone to random disturbance. And they go into the substrate. So the interest in DSA, though it seems sensitive to the guiding pattern size.

ebmfuser
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
ebmfuser   2/17/2012 11:06:42 PM
NO RATINGS
AND, the cost savings in masks alone would be enormous!!!

ebmfuser
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
ebmfuser   2/17/2012 11:04:02 PM
NO RATINGS
Truly a shame that more 'professionals' don't look more seriously at e-beam lithography themselves, and not take the word of people in the photomask industry, who would directly be threatened if mask-less lithography came into popularity. E-beam litho has demonstrated nano-level capability for more than 20 years, with comparative overlay capability equaling the best aligners out there. Yes, throughput is an issue, but at 1/6 (or less) the cost of an good immersion stepper, you can buy several!!! Truth is that even the finest nano-imprint tool or EUV stepper will require masks, and they will only be available via e-beam lithography (as well as being ridiculously expensive and short lived). Direct write is a viable technology - today!

resistion
User Rank
CEO
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 9:18:37 AM
NO RATINGS
The critical layer tools need to be double or higher throughput, along with the track.

resistion
User Rank
CEO
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 6:33:17 AM
NO RATINGS
I think we can only count 10 nm and 7 nm, then what..and that would not be single patterning anymore either. CD variations on the order of lattice constants.

resistion
User Rank
CEO
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 6:19:31 AM
NO RATINGS
EUV doesn't have so many nodes left. Unless you mean to include the next wavelength.

Page 1 / 2   >   >>


Flash Poll
EE Life
Frankenstein's Fix, Teardowns, Sideshows, Design Contests, Reader Content & More
Engineer's Bookshelf
Caleb Kraft

The Martian: A Delightful Exploration of Math, Mars & Feces
Caleb Kraft
6 comments
To say that Andy Weir's The Martian is an exploration of math, Mars, and feces is a slight simplification. I doubt that the author would have any complaints, though.

The Engineering Life - Around the Web
Caleb Kraft

Surprise TOQ Teardown at EELive!
Caleb Kraft
Post a comment
This year, for EELive! I had a little surprise that I was quite eager to share. Qualcomm had given us a TOQ smart watch in order to award someone a prize. We were given complete freedom to ...

Design Contests & Competitions
Caleb Kraft

Join The Balancing Act With April's Caption Contest
Caleb Kraft
57 comments
Sometimes it can feel like you're really performing in the big tent when presenting your hardware. This month's caption contest exemplifies this wonderfully.

Engineering Investigations
Caleb Kraft

Frankenstein's Fix: The Winners Announced!
Caleb Kraft
8 comments
The Frankenstein's Fix contest for the Tektronix Scope has finally officially come to an end. We had an incredibly amusing live chat earlier today to announce the winners. However, we ...

Top Comments of the Week
Like Us on Facebook
EE Times on Twitter
EE Times Twitter Feed

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)