For Cymer it seems end of summer not likely, maybe end of year. It's still a big slip which will impact ASML's intended rollout.
Below 10 nm, the 13.5 nm wavelength does not seem viable. For example, 7 nm with 0.5 NA is already fundamentally excluded. The window has essentially closed, and the purchasers of the NXE EUV tools are left with big bags.
The illumination source power is a show stopper for production use of EUV but it's not the only issue. The entire EUV infrastructure including masks and resists is unproven. Added to those problems is the belief by many that at this adoption rate EUV will need to change wavelength to 6.5 nm before it becomes a mainstream tool for manufacturing. There seems no end in sight to the development resources needed to make EUV lithography production worthy.
Drones are, in essence, flying autonomous vehicles. Pros and cons surrounding drones today might well foreshadow the debate over the development of self-driving cars. In the context of a strongly regulated aviation industry, "self-flying" drones pose a fresh challenge. How safe is it to fly drones in different environments? Should drones be required for visual line of sight – as are piloted airplanes? Join EE Times' Junko Yoshida as she moderates a panel of drone experts.