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resistion
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re: Source problems cause EUV revenue delay, says ASML
resistion   5/6/2012 8:00:33 AM
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For Cymer it seems end of summer not likely, maybe end of year. It's still a big slip which will impact ASML's intended rollout. http://web.utsandiego.com/news/2012/apr/25/cymer-boosts-investment-lasers-used-make-computer-/

double-o-nothing
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re: Source problems cause EUV revenue delay, says ASML
double-o-nothing   4/20/2012 1:45:49 AM
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Below 10 nm, the 13.5 nm wavelength does not seem viable. For example, 7 nm with 0.5 NA is already fundamentally excluded. The window has essentially closed, and the purchasers of the NXE EUV tools are left with big bags.

any1
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re: Source problems cause EUV revenue delay, says ASML
any1   4/19/2012 3:16:03 PM
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The illumination source power is a show stopper for production use of EUV but it's not the only issue. The entire EUV infrastructure including masks and resists is unproven. Added to those problems is the belief by many that at this adoption rate EUV will need to change wavelength to 6.5 nm before it becomes a mainstream tool for manufacturing. There seems no end in sight to the development resources needed to make EUV lithography production worthy.

resistion
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re: Source problems cause EUV revenue delay, says ASML
resistion   4/19/2012 2:09:52 PM
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When dose goes from 15 to 30 mj/cm2 then 100 w won't be enough, they'll need 200.



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As data rates begin to move beyond 25 Gbps channels, new problems arise. Getting to 50 Gbps channels might not be possible with the traditional NRZ (2-level) signaling. PAM4 lets data rates double with only a small increase in channel bandwidth by sending two bits per symbol. But, it brings new measurement and analysis problems. Signal integrity sage Ransom Stephens will explain how PAM4 differs from NRZ and what to expect in design, measurement, and signal analysis.

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