Breaking News
Comments
Newest First | Oldest First | Threaded View
Page 1 / 2   >   >>
resistion
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
resistion   7/4/2012 2:37:20 PM
NO RATINGS
The fact is, 20 nm has come to pass without EUV. And EUV is already too slow for 20 nm and below. http://www.electroiq.com/articles/sst/2012/06/euvl-workshop-focuses-on-source-power-timing.html

Diogenes53
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   7/4/2012 2:24:01 PM
NO RATINGS
ASML is perfectly happy to sell two wildly profitable immersion tools for double patterning instead of one unprofitable jerryrigged, Rube Goldberg soft x-ray machine

Diogenes53
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   7/4/2012 2:22:20 PM
NO RATINGS
The ONLY inevitabilities are death and taxes. I assure you EUV (x-ray!) is not inevitable.

MarineDir
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
MarineDir   6/11/2012 9:53:00 AM
NO RATINGS
The industry will be waiting for the next big player for EUV manufacturers. The manufacturer that is able to produce EUV litho machines for the market will stand to get an early lead, an because the global demand will be met by them, they will gain a sizeable share in the market as well. This would be an interesting development to follow, and hopefully there will be more updates on this. Mary - http://www.jensenmarinedirect.com

Diogenes53
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:44:24 AM
NO RATINGS
This was from the same EE Times issue:Source problems cause EUV revenue delay, says ASML Peter Clarke 4/19/2012 8:14 AM EDT LONDON – Lithography equipment developer ASML Holding NV (Veldhoven, The Netherlands) has said that a delay in the availability of illumination power sources has prompted it to push out revenue recognition on the first two production EUV lithography machines, currently being assembled at the company's headquarters. Sound inevitable?

Diogenes53
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:43:42 AM
NO RATINGS
In this same issue of EE Times: Source problems cause EUV revenue delay, says ASML Peter Clarke 4/19/2012 8:14 AM EDT LONDON – Lithography equipment developer ASML Holding NV (Veldhoven, The Netherlands) has said that a delay in the availability of illumination power sources has prompted it to push out revenue recognition on the first two production EUV lithography machines, currently being assembled at the company's headquarters. Zzzzzzzzzzzzzz........ the more things change.......

Diogenes53
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:41:06 AM
NO RATINGS
So it was believed at 65, 45, 32, 22, 14, and, now, 10nm. Inevitable at each node. Definition:unable to be avoided, evaded, or escaped; certain; necessary: an inevitable conclusion. 2. sure to occur, happen, or come; unalterable: The inevitable end of human life is death. Particularly as regards #2, is EUV as "inevitable" as death? If so, I now feel immortal!

Diogenes53
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:36:43 AM
NO RATINGS
Thank goodness the "race" to EUV, which started as a sprint (coming at 65nm), has "ended" in a marathon (1nm?). Sadly, for those users who invested their careers in EUV, it is more like SETI, the endless search for extraterrestrial life. It may happen, but not likely in our lifetime. Does Mr. Meurice care? Of course not. EUV/SXPL (yes, fans, it is STILL x-ray). As long as he can sell 2 immersion tools without meaningful competition, EUV remains a shell game.

resistion
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
resistion   4/22/2012 3:23:49 PM
NO RATINGS
I think now a problem is EUV cannot be superior for more than one or two nodes over the existing lithography. That may not be enough to justify. Also the issues are not monitored completely enough. Besides source power, how about defects, LER?

KB3001
User Rank
Author
re: DRAM, foundry logic in race to use EUV, says ASML
KB3001   4/22/2012 1:08:50 PM
NO RATINGS
Is not it inevitable that EUV will eventually win at some lower process node?

Page 1 / 2   >   >>


Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
Radio
NEXT UPCOMING BROADCAST

What are the engineering and design challenges in creating successful IoT devices? These devices are usually small, resource-constrained electronics designed to sense, collect, send, and/or interpret data. Some of the devices need to be smart enough to act upon data in real time, 24/7. Are the design challenges the same as with embedded systems, but with a little developer- and IT-skills added in? What do engineers need to know? Rick Merritt talks with two experts about the tools and best options for designing IoT devices in 2016. Specifically the guests will discuss sensors, security, and lessons from IoT deployments.
Most Recent Comments
dnadler017
 
realjjj
 
realjjj
 
jimfordbroadcom
 
jimfordbroadcom
 
resistion
 
jimfordbroadcom
 
jimfordbroadcom
 
realjjj
Like Us on Facebook
Special Video Section
LED lighting is an important feature in today’s and future ...
05:27
The LT8602 has two high voltage buck regulators with an ...
05:18
The quality and reliability of Mill-Max's two-piece ...
01:34
Why the multicopter? It has every thing in it. 58 of ...
Security is important in all parts of the IoT chain, ...
Infineon explains their philosophy and why the multicopter ...
The LTC4282 Hot SwapTM controller allows a board to be ...
This video highlights the Zynq® UltraScale+™ MPSoC, and sho...
Homeowners may soon be able to store the energy generated ...
The LTC®6363 is a low power, low noise, fully differential ...
See the Virtex® UltraScale+™ FPGA with 32.75G backplane ...
Vincent Ching, applications engineer at Avago Technologies, ...
The LT®6375 is a unity-gain difference amplifier which ...
The LTC®4015 is a complete synchronous buck controller/ ...
10:35
The LTC®2983 measures a wide variety of temperature sensors ...
The LTC®3886 is a dual PolyPhase DC/DC synchronous ...
The LTC®2348-18 is an 18-bit, low noise 8-channel ...
The LT®3042 is a high performance low dropout linear ...