Breaking News
Comments
Newest First | Oldest First | Threaded View
Page 1 / 2   >   >>
resistion
User Rank
CEO
re: DRAM, foundry logic in race to use EUV, says ASML
resistion   7/4/2012 2:37:20 PM
NO RATINGS
The fact is, 20 nm has come to pass without EUV. And EUV is already too slow for 20 nm and below. http://www.electroiq.com/articles/sst/2012/06/euvl-workshop-focuses-on-source-power-timing.html

Diogenes53
User Rank
Rookie
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   7/4/2012 2:24:01 PM
NO RATINGS
ASML is perfectly happy to sell two wildly profitable immersion tools for double patterning instead of one unprofitable jerryrigged, Rube Goldberg soft x-ray machine

Diogenes53
User Rank
Rookie
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   7/4/2012 2:22:20 PM
NO RATINGS
The ONLY inevitabilities are death and taxes. I assure you EUV (x-ray!) is not inevitable.

MarineDir
User Rank
Rookie
re: DRAM, foundry logic in race to use EUV, says ASML
MarineDir   6/11/2012 9:53:00 AM
NO RATINGS
The industry will be waiting for the next big player for EUV manufacturers. The manufacturer that is able to produce EUV litho machines for the market will stand to get an early lead, an because the global demand will be met by them, they will gain a sizeable share in the market as well. This would be an interesting development to follow, and hopefully there will be more updates on this. Mary - http://www.jensenmarinedirect.com

Diogenes53
User Rank
Rookie
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:44:24 AM
NO RATINGS
This was from the same EE Times issue:Source problems cause EUV revenue delay, says ASML Peter Clarke 4/19/2012 8:14 AM EDT LONDON – Lithography equipment developer ASML Holding NV (Veldhoven, The Netherlands) has said that a delay in the availability of illumination power sources has prompted it to push out revenue recognition on the first two production EUV lithography machines, currently being assembled at the company's headquarters. Sound inevitable?

Diogenes53
User Rank
Rookie
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:43:42 AM
NO RATINGS
In this same issue of EE Times: Source problems cause EUV revenue delay, says ASML Peter Clarke 4/19/2012 8:14 AM EDT LONDON – Lithography equipment developer ASML Holding NV (Veldhoven, The Netherlands) has said that a delay in the availability of illumination power sources has prompted it to push out revenue recognition on the first two production EUV lithography machines, currently being assembled at the company's headquarters. Zzzzzzzzzzzzzz........ the more things change.......

Diogenes53
User Rank
Rookie
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:41:06 AM
NO RATINGS
So it was believed at 65, 45, 32, 22, 14, and, now, 10nm. Inevitable at each node. Definition:unable to be avoided, evaded, or escaped; certain; necessary: an inevitable conclusion. 2. sure to occur, happen, or come; unalterable: The inevitable end of human life is death. Particularly as regards #2, is EUV as "inevitable" as death? If so, I now feel immortal!

Diogenes53
User Rank
Rookie
re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:36:43 AM
NO RATINGS
Thank goodness the "race" to EUV, which started as a sprint (coming at 65nm), has "ended" in a marathon (1nm?). Sadly, for those users who invested their careers in EUV, it is more like SETI, the endless search for extraterrestrial life. It may happen, but not likely in our lifetime. Does Mr. Meurice care? Of course not. EUV/SXPL (yes, fans, it is STILL x-ray). As long as he can sell 2 immersion tools without meaningful competition, EUV remains a shell game.

resistion
User Rank
CEO
re: DRAM, foundry logic in race to use EUV, says ASML
resistion   4/22/2012 3:23:49 PM
NO RATINGS
I think now a problem is EUV cannot be superior for more than one or two nodes over the existing lithography. That may not be enough to justify. Also the issues are not monitored completely enough. Besides source power, how about defects, LER?

KB3001
User Rank
CEO
re: DRAM, foundry logic in race to use EUV, says ASML
KB3001   4/22/2012 1:08:50 PM
NO RATINGS
Is not it inevitable that EUV will eventually win at some lower process node?

Page 1 / 2   >   >>


EE Life
Frankenstein's Fix, Teardowns, Sideshows, Design Contests, Reader Content & More
Max Maxfield

Fist Bumps & the Zombie Apocalypse
Max Maxfield
40 comments
Are you concerned about the possibility of a Zombie Apocalypse or do you scoff at the thought of such an eventuality? If the latter, would you be surprised to hear that the US military has ...

Rishabh N. Mahajani, High School Senior and Future Engineer

Future Engineers: Don’t 'Trip Up' on Your College Road Trip
Rishabh N. Mahajani, High School Senior and Future Engineer
9 comments
A future engineer shares his impressions of a recent tour of top schools and offers advice on making the most of the time-honored tradition of the college road trip.

Larry Desjardin

Engineers Should Study Finance: 5 Reasons Why
Larry Desjardin
41 comments
I'm a big proponent of engineers learning financial basics. Why? Because engineers are making decisions all the time, in multiple ways. Having a good financial understanding guides these ...

Karen Field

July Cartoon Caption Contest: Let's Talk Some Trash
Karen Field
151 comments
Steve Jobs allegedly got his start by dumpster diving with the Computer Club at Homestead High in the early 1970s.

Top Comments of the Week
Flash Poll
Like Us on Facebook
EE Times on Twitter
EE Times Twitter Feed

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)