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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/24/2012 9:55:08 PM
Directed self-assembly is not the whole answer, but it is an answer and its one that has the potential to touch other aspects of extending lithography down to sub-wavelength dimensions. I'm excited about what SRC and other researcher groups developing advanced copolymer formulations may be cooking up :)

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re: SRC clears path to 14-nm with directed self-assembly litho
Les_Slater   5/24/2012 9:03:10 PM
Moore's law needs to be updated. Our real concern is work done per given real estate per unit time. There are power and cooling issues too.

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re: SRC clears path to 14-nm with directed self-assembly litho
any1   5/24/2012 8:06:58 PM
This is good stuff with great promise, but of course this is still a nascent technology that will not be manufacturing ready in time to stop Moore's law from stalling in the next few years. Perhaps if we hadn't spent so much money on EUV lithography then resources could have been made available to accelerate directed self-assembly technology years ago.

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As data rates begin to move beyond 25 Gbps channels, new problems arise. Getting to 50 Gbps channels might not be possible with the traditional NRZ (2-level) signaling. PAM4 lets data rates double with only a small increase in channel bandwidth by sending two bits per symbol. But, it brings new measurement and analysis problems. Signal integrity sage Ransom Stephens will explain how PAM4 differs from NRZ and what to expect in design, measurement, and signal analysis.

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