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R_Colin_Johnson
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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/29/2012 8:09:58 PM
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Immersion?

Kinnar
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re: SRC clears path to 14-nm with directed self-assembly litho
Kinnar   5/27/2012 7:15:26 PM
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Self Assembly is a very important property of Nano Technology materials, it is good to know that Directed Self Assembly will be helpful in semiconductor manufacturing process as well.

Diogenes53
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re: SRC clears path to 14-nm with directed self-assembly litho
Diogenes53   5/27/2012 5:21:30 PM
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Sadly, yet another shiny penny, another in the 30+ year search for an alternative to optical. Not sure whether this is due to ADD on the part of lithographers, or simply the "nice from far but from nice" syndrome of those without perspective. We have poured billions into X-ray (a.k.a. EUV) without commercial success. What makes anyone think you can start with yet another shiny penny at the 10nm node? Its bizarre. The only technologies that can succeed are those built on the optical lithography infrastructure. There is only one.

resistion
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re: SRC clears path to 14-nm with directed self-assembly litho
resistion   5/27/2012 4:58:27 PM
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That's an important perspective. Silicon nitride is at 0.8 nm, only 1/20 of 16 nm!

R_Colin_Johnson
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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/27/2012 11:14:27 AM
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We are fast approaching the lower limit, since the crystalline lattice of silicon, for instance, has a spacing of about 0.5 nm. But scientists who work with these tiny dimensions call .5nm, 5 angstroms, and the atoms themselves are much much smaller--measured in hundreds of picometers (1pm = 1/100th of an angstrom).

resistion
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re: SRC clears path to 14-nm with directed self-assembly litho
resistion   5/27/2012 6:13:18 AM
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Can 7 nm lines 7 nm apart reliably carry electrical signals? Not much room for barrier layers, even.

R_Colin_Johnson
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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/26/2012 8:29:05 PM
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The particular co-polymer here produces the 20-nm features, with other formulations being developed for single-digit geometries.

R_Colin_Johnson
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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/26/2012 8:28:12 PM
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SRC claims this is the first production ready use of directed self assembly--that previous demonstrations were just test structures, but that Stanford's technique is ready for 22-nm today, can be extended as-is to 14-nm, and is being developed for single-digit geometries by formulating new co-polymers. "Directed self-assembly (DSA)—a technology based on a concept that was virtually unknown outside of research labs a few years ago..." http://www.eetimes.com/electronics-news/4213705/Momentum-builds-for-directed-self-assembly

wilber_xbox
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re: SRC clears path to 14-nm with directed self-assembly litho
wilber_xbox   5/26/2012 6:01:37 PM
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are there any buyers for this technology? DSA has been around for some time now so i missed the main advantage of this method over previous methods.

resistion
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re: SRC clears path to 14-nm with directed self-assembly litho
resistion   5/26/2012 2:58:26 AM
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Self-assembly is an indication of natural molecular scales in polymers, good to note. Why ~20 nm?

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