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re: Synopsys exec sees whole new ball game at 20-nm
resistion   6/6/2012 5:15:18 AM
"Bohr did not provide further details about its 14nm technology, but he reiterated the company’s previous position that extreme ultraviolet (EUV) lithography will not be ready in time for the 14nm node. In previous reports, Intel said it plans to extend traditional 193nm optical lithography down to 14nm, with the help of quintuple patterning and other techniques." http://www.embeddedintel.com/from_intel.php?article=2119 So now it appear those complaining about double patterning are really shy of process discipline, compared to Intel.

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re: Synopsys exec sees whole new ball game at 20-nm
mcgrathdylan   6/5/2012 10:07:00 PM
I think Intel is mostly an exception. But there likely have been some cases of limited double patterning. But at 20-nm, apparently, there is no way around it. It is required.

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re: Synopsys exec sees whole new ball game at 20-nm
resistion   6/5/2012 5:36:41 PM
Intel has been using alternating phase shift masks starting at 65 nm. This is already a double exposure involved. Add pitch double patterning, looks like they got multiple patterning on their hands already. They must be the exception if everyone using foundries is only starting to talk double patterning at 20 nm.

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