Well all the first wave of NXE:3300 EUV lithography machines are for 300-mm diameter wafers but will be used for process development so I would expect them to go to the few chip companies that have an interest in carrying on with Moore's Law.
It is also the case that throughput is not so important in process R&D giving ASML a bit longer to try and get a source that will provide high-volume throughput and be suitable to put in a manufacturing line.
NASA's Orion Flight Software Production Systems Manager Darrel G. Raines joins Planet Analog Editor Steve Taranovich and Embedded.com Editor Max Maxfield to talk about embedded flight software used in Orion Spacecraft, part of NASA's Mars mission. Live radio show and live chat. Get your questions ready.
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