Masks have always been an issue for Xray ...oops I mean EUV litho. Really, the masks pretty much need to be perfect as far as detectable defects are concerned for high volume manufacturing. For reflective optical elements at EUV wavelengths this is both difficult and expensive to achieve. It will be a continuing issue for EUV litho despite these types of press releases.
X-ray masks will be ready before the x-ray stepper can use them. And the mask makers will have lost $$$ on their development. With all the $$$ flowing into ASML to help them with 450mm, perhaps some should dribble to maskmakers.
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