Theoretical conversion eff. limit for CIGS thin film, as predicted by NREL of DOE ( Boulder, CO ), is as high as 18 % ( as compared to 24 % for single xtal Si ) but only up to 16 % has been demonstrated so far in lab samples.
Because it has 4 components and separates into many quasi-stable phases depending on processing, CIGS thin film is a notoriously difficult material to control and shows variation in conversion eff. Many US companies have been struggling with this for years.
What I would like to know is what sort of production rate and yield TSMC is managing to get at their Pilot Line.
Otherwise this report is just PR flak.
As we unveil EE Times’ 2015 Silicon 60 list, journalist & Silicon 60 researcher Peter Clarke hosts a conversation on startups in the electronics industry. Panelists Dan Armbrust (investment firm Silicon Catalyst), Andrew Kau (venture capital firm Walden International), and Stan Boland (successful serial entrepreneur, former CEO of Neul, Icera) join in the live debate.