Globalfoundries should focus on being able to make 20nm planar work before they make promises on 14nm FinFET technologies, if they can't make 20nm planar devices work then 14nm FinFETs will be nearly impossible. Lots of smoke here ...... We will see if customers can tape out early designs in 2014 in 14nm.
Again, it is an EUV marketing chant. If with breakthrough, arrogant like ASML won't invite Intel,TSMC, Samsung to invest her recently. Intel even urged ASML to expedite ArF immersion development in 450mm lithograpgy. I guess we would stick on 20nm for a long while and 28nm or 20nm node would be a historically sweet spots for foundries.
The backers of Globalfoundries have deep pockets but I think competing with Intel is an unhealthy obsession for them. I like profitable foundries that keep the mature processes going so people can make lots of mixed-mode chips.
Maybe you better get some more details on this. You don't want longer pulse, you want larger duty cycle and shorter pulse duration. And it turns out the resist dose window will not even benefit from a power boost.
EUV little comprehended has found a breakthrough high average energy source ( ~100x greater than laser plasma EUV sources ) and you might end up eating your words in 2-3 years when the source integration is completed. There was an announcement by a U?Washington plasma physics prof about a Zpinch EUV plasma source ( discharge is magnetically confined by a current sheath ) that makes a simple longer pulse source of extraordinary net average power increase for EUV illumination.
I have little understanding of the technical issues relating to the source integration into the ASML EUV stepper, but the source itself is apparently a possibly compelling breakthrough.
Within weeks of disclosure of the source breakthrough by its professor inventor I think I remember that ASML issued an announcement that timeline for EUV "deployment" has been pulled in .... ( implying they will be using the source, but not mentioned at all )
I think there is a change that production viability prospects for EUV might have improved significantly, but this is as yet just decent speculation, based on ?coincidences of a technical nature ( from a process engineer )
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