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double-o-nothing
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re: TSMC taps ARM's V8 on road to 16 nm FinFET
double-o-nothing   10/18/2012 3:58:51 PM
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Even at 14 nm node, there will be more double patterning layers than multi-patterning layers for sure. ASML has already said EUV would only be introduced on a few layers, allowing mix-and-match with immersion, but by that time, even the middle layers would be requiring double patterning.

chipmonk0
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re: TSMC taps ARM's V8 on road to 16 nm FinFET
chipmonk0   10/18/2012 4:04:26 PM
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Thx

marcos83
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re: TSMC taps ARM's V8 on road to 16 nm FinFET
marcos83   10/19/2012 11:42:34 AM
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I think this industry is stalling due to the limitations of resolution. The big players have relied on Moore's law as the backbone of their road-map.

de_la_rosa
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re: TSMC taps ARM's V8 on road to 16 nm FinFET
de_la_rosa   10/20/2012 9:06:39 PM
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maybe the last presentation we will see from a big player. Beyond 14nm node, is impossible. Unless electron-beam lithography has something under their sleeve?

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