Even at 14 nm node, there will be more double patterning layers than multi-patterning layers for sure.
ASML has already said EUV would only be introduced on a few layers, allowing mix-and-match with immersion, but by that time, even the middle layers would be requiring double patterning.
NASA's Orion Flight Software Production Systems Manager Darrel G. Raines joins Planet Analog Editor Steve Taranovich and Embedded.com Editor Max Maxfield to talk about embedded flight software used in Orion Spacecraft, part of NASA's Mars mission. Live radio show and live chat. Get your questions ready.
Brought to you by