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resistion
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re: ASML doubles down on EUV
resistion   10/18/2012 4:55:43 AM
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It's true testimony the EUV technology development was underestimated again and again. Why should ASML stop there? Why not buy the companies to get the optics and inspection tools done?

resistion
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re: ASML doubles down on EUV
resistion   10/18/2012 2:10:45 PM
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The funny thing is a year and a half ago, they rejected the notion of buying Cymer. http://www.bloomberg.com/news/2011-05-26/asml-cfo-says-cymer-takeover-speculation-is-nonsense-1-.html

any1
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re: ASML doubles down on EUV
any1   10/18/2012 6:06:53 PM
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We seem to be transitioning from vertically integrated companies to a whole vertically integrated industry. Too much consolidation will cause problems in the future. Is this cabal of companies already too big to fail? As @resistion says, why not buy all of the other major players essential to the EUV infrastructure while you're at it?

mcgrathdylan
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re: ASML doubles down on EUV
mcgrathdylan   10/18/2012 8:07:27 PM
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I don't know that ASML has the means or the desire for such a shopping spree. Buying Cymer is one thing; buying every major player essential to the EUV infrastructure? That seems a bit much. It is interesting, though, that the place ASML choose to buy its way in is the area that is standing in EUV's way. Despite what ASML says about selling sources to other litho vendors, you wonder if they'll keep them all to themselves (assuming of course that the technology progresses to the point where throughput is suitable).

any1
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re: ASML doubles down on EUV
any1   10/18/2012 8:41:00 PM
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The EUV source is just todays most obvious barrier to success. Tomorrow it will be the reflective optics including the masks, mask inspection and cleaning, and then resists. The companies involved in all of those areas need R & D investment help as well. There are still many obstacles to high volume manufacturing with EUV. And ASML alone wouldn't have to buy all those companies. Intel, Samsung, and TSMC could help. At this point they should just spin off a new company called EUV Inc. and invite a few more big semi companies to join. But that might make it too easy to figure out how much money they are spending on EUV.

PV-Geek
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re: ASML doubles down on EUV
PV-Geek   10/18/2012 9:39:41 PM
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Just as the foundry business consolidated as the costs skyrocketed, now the equipment business will do the same. And just as everyone fears the growth of a single foundry domination to be bad for the industry, they will say the same about this segment. The costs just make any other option impractical, like it or not.

any1
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re: ASML doubles down on EUV
any1   10/22/2012 6:55:12 PM
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It's not just the consolidation of a couple of equipment companies. Remember ASML invited Intel, Samsung, and TSMC to become part owners as well. So now we have everything from design through fabrication AND the equipment used to do it all intertwined together. At some point if the cost of making EUV work is so costly then maybe it's just not viable right now. Maybe the single minded pursuit of EUV litho is draining investment out of the semi industry that could better be spent elsewhere.

marcos83
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re: ASML doubles down on EUV
marcos83   10/19/2012 11:14:33 AM
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"The technology haws proven its viability in terms of resolution" Really? I have not seen anything impressive. They are flogging a dead horse.

de_la_rosa
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re: ASML doubles down on EUV
de_la_rosa   10/20/2012 9:12:03 PM
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ASML MT must be stressed.

photoneer
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re: ASML doubles down on EUV
photoneer   10/19/2012 2:58:57 PM
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When has a technology ever improved 400% in the last 10% of its R&D cycle?

resistion
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re: ASML doubles down on EUV
resistion   10/21/2012 3:38:38 AM
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Buying cymer might be best way to get out of EUV, since cymer is 80 % of the duv laser base. They gain even more with multiple double patterning layers.

double-o-nothing
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re: ASML doubles down on EUV
double-o-nothing   10/21/2012 12:17:36 PM
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With only a few photons absorbed per sq. nm., no wonder the edge roughness is so persistent at the nm scale.

resistion
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re: ASML doubles down on EUV
resistion   10/25/2012 6:43:50 AM
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The Sematech TWG showed this year that the low thickness of EUV resist is also a significant factor.

resistion
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re: ASML doubles down on EUV
resistion   10/25/2012 12:43:19 PM
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And as the resist becomes thinner and thinner, for smaller CD design rules, fewer and fewer photons are absorbed per sq. nm, exacerbating the shot noise and LER issues.

resistion
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CEO
re: ASML doubles down on EUV
resistion   11/17/2012 1:52:27 PM
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Nikon may be planning a coup against ASML in EUV. http://www.nikonprecision.com/ereview/spring_2012/news-04.html



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