The 14 nm ramp should proceed at Ireland, but with less training.
In the complementary approach, EUV is still one of two exposure passes because mask defects are not manageable yet for 10 nm. So it's still more expensive than current double patterning.
Intel Ramp engineer claimed moral at Intel was at a all time low.
Many forced plant shut down over December holidays. 14nm delay relates to "significant process problems"
Even worse his manager said there is talk about a work force reduction in 2013 that will be announced in Q1.
Intel has announced that they are going to build yet another Fab building right next to D1X in Hillsboro, Oregon. It will be slightly bigger than D1X. (Total area in the buildings will be larger than the Pentagon.) My assumption was that they were going to use it to bring up non-X86 processes as per various rumors. A part of this would be to clone their World's-Best Fab Bringup team. That team is concentrating on bringing up D1X real soon now.
If/when they succeed, they would normally do the copy-exactly to Arizona and apparently Ireland.
OTOH, they can bring the new building up while training a second team. The decision to use the new building for other device types or X86 can be made based on market conditions a year or two out.
What are the engineering and design challenges in creating successful IoT devices? These devices are usually small, resource-constrained electronics designed to sense, collect, send, and/or interpret data. Some of the devices need to be smart enough to act upon data in real time, 24/7. Specifically the guests will discuss sensors, security, and lessons from IoT deployments.