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Or_Bach
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re: Moore’s Law seen hitting big bump at 14 nm
Or_Bach   12/15/2012 4:04:14 AM
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Yes, As we been saying - Monolithic 3D is finally practical, so lets start to scale up, as scale down is no longer easy and full of benefits. And it looks that the first vendors to reach this conclusion are the NAND NV vendors, as had been presented across this IEDM.

resistion
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re: Moore’s Law seen hitting big bump at 14 nm
resistion   12/14/2012 2:21:48 PM
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He also mentioned immersion (193 nm not EUV) for 7 nm, though that did surprise me somewhat.

jeremybirch
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re: Moore’s Law seen hitting big bump at 14 nm
jeremybirch   12/14/2012 12:08:09 PM
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surely EUV is optical just a shorter wavelength source?! Perhaps they mean optical vs ebeam?

resistion
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re: Moore’s Law seen hitting big bump at 14 nm
resistion   12/13/2012 12:54:10 AM
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The problem for EUV is it has only one application space and that window is shrinking. In addition, the higher energy associated with its higher resolution wavelength produced some fundamental new effects, e.g., ionization, shot noise, etc., which will require more time to be grasped. On the other hand, 193 nm is more familiar, and the temptation to merely increase patterning steps is there. Although such increases will be more complex and costly, a detailed calculation, factoring in number of layers, volume, performance, power, etc. is needed to determine the overall cost impact to the particular product. There won't be a unique "right" answer unfortunately. But as you implied, leakage gets worse, and interconnect performance will also get worse. So a breakout from this trend is needed, soon.

green_is_now
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re: Moore’s Law seen hitting big bump at 14 nm
green_is_now   12/13/2012 12:36:34 AM
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What is the performance/leakage penalty at a given feature size for a given available wavelength? 193nm? 13.5nm? If EUV allows feature shrink without performance/leakage penalty compared to UV used now for comperable cost EUV wins hands down. Chasing moores law min feature size only and not performance/leakage metrics is not a solution

green_is_now
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re: Moore’s Law seen hitting big bump at 14 nm
green_is_now   12/13/2012 12:09:48 AM
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The facts are in process shrink below 1/10th of wavelength will require multiple patterning. where increased cost of EUV equipment break even with double, triple patterning costs still being played out with rapid development in the EUV space. If they would just hire me it could go much faster. :)

green_is_now
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CEO
re: Moore’s Law seen hitting big bump at 14 nm
green_is_now   12/13/2012 12:03:43 AM
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once upon a time...UV lithography impossible...

resistion
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CEO
re: Moore’s Law seen hitting big bump at 14 nm
resistion   12/12/2012 2:56:44 PM
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Remember to heed the warning of node renaming.

unknown multiplier
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re: Moore’s Law seen hitting big bump at 14 nm
unknown multiplier   12/12/2012 2:55:16 PM
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GlobalFoundries already gave up on EUV it seems: http://semimd.com/blog/2012/12/11/globalfoundries-accelerates-10nm-process/ “10nm will be optical,” he said. “We have evidence that we can do 7nm with immersion.”

sprite0022
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Manager
re: Moore’s Law seen hitting big bump at 14 nm
sprite0022   12/12/2012 3:37:44 AM
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stop argument, time to place your bet now. life is full of gambling, ultrabook, android, who knows what ll happen just jump...

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