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Ron Neale
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re: Do annular electrodes present a scalable PCM solution? - Part 2
Ron Neale   5/20/2013 3:51:57 PM
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Resistion I think it is always possible to affix any or value definition you wish to hp (usually defined as half distance between minimum features). The self assembly (S-A) process) must be considered as independent of lithography. The distance between the S-A oxide discs will be defined by the chemical-oxidation process and added as a sub-lithographic overlay onto the best conventional lithographic process; in my example 20nm lithography. The S K Hynix 1Gb PCM that I covered in one of my earlier EETimes PCM papers was an example of a 42nm minimum feature size resulting in a 2F^2 cell with an hp of 42nm. Again, in Part 2 above my “d” was the diameter of the oxide discs and that has nothing to do with lithography.

resistion
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re: Do annular electrodes present a scalable PCM solution? - Part 2
resistion   5/20/2013 1:36:22 PM
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Maybe you can say hp is 20 nm and the cell is 4*hp^2, but if hp is 4x diameter, the cell is 4*16*d^2 or 64d^2. Some schools use hp as F some use d as F. Although hp is more in tune with lithographic requirements, d is more in tune with actual process requirements.

Ron Neale
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re: Do annular electrodes present a scalable PCM solution? - Part 2
Ron Neale   5/20/2013 8:53:39 AM
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Resistion- Perhaps you can share with us the basis of your conclusion. In my figure 9 above, consider the example of 5nm oxide discs (your nano particles) and a fill factor of 50% for a 20 x 20nm (I.e F =20nm) aperture just over 10 discs are required. Even if you square-packed the discs in the same 20 x 20nm aperture so they were all touching each other a simple calculation shows 16 discs would be required. The nano particles (discs) are sub-lithographic features so the number of them and the diameter should be independent of the lithographic feature size F. Assuming you are using F in the conventional manner as minimum lithographic feature size in my square aperture example the cell size will be dependent on the lithographic feature size as 4F^2. The main questions that have to be answered for self-assembly (S-A) is can the discs be produced with diameters of less than 5nm and more importantly will the claimed low reset current density be observed.

resistion
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re: Do annular electrodes present a scalable PCM solution? - Part 2
resistion   5/20/2013 4:34:20 AM
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Much greater than 10F^2.

resistion
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re: Do annular electrodes present a scalable PCM solution? - Part 2
resistion   5/20/2013 4:28:33 AM
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If you define F as size of the nanoparticle, this cell will be much greater than ^2.



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As data rates begin to move beyond 25 Gbps channels, new problems arise. Getting to 50 Gbps channels might not be possible with the traditional NRZ (2-level) signaling. PAM4 lets data rates double with only a small increase in channel bandwidth by sending two bits per symbol. But, it brings new measurement and analysis problems. Signal integrity sage Ransom Stephens will explain how PAM4 differs from NRZ and what to expect in design, measurement, and signal analysis.

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