Embedded Systems Conference
Breaking News
Comments
Oldest First | Newest First | Threaded View
Page 1 / 3   >   >>
mcgrathdylan
User Rank
Author
Encouraging progress?
mcgrathdylan   7/12/2013 3:50:33 PM
NO RATINGS
This seems like an old story, I know. The development of EUV lithography has been painfully slow. But it does seem like they are getting there, slowly but surely. The industry is really depending on EUV.

any1
User Rank
Author
No, there's not much new with EUV litho
any1   7/12/2013 6:07:07 PM
NO RATINGS
Yes, the technical side of EUV lithography seems to be making slow but steady progress.  However, the cost side of EUV litho will take much longer.  Eventhough it might become less expensive than quadruple patterning using immersion 193 nm lithography, it will still be prohibitively expensive for most applications for several more years.  

mcgrathdylan
User Rank
Author
Re: No, there's not much new with EUV litho
mcgrathdylan   7/12/2013 6:31:35 PM
NO RATINGS
It's probably going to be a while. I should have mentioned in this posting, too, that the power source is the big issue, but there are still otherss. Since the masks will have no pellicle (they have discovered a material that is transmissive enough), mask defects and mask cleaning are a couple big issues to solve. And right now nobody knows how long the masks will last. (IMEC does have a research program going on finding ways to clean the EUV masks).

JimMcGregor
User Rank
Author
EUC is a hard bet
JimMcGregor   7/12/2013 8:23:09 PM
NO RATINGS
EUV has been under development since 2006 and most of the foundries do not expect EUV until at least the 7nm generation, one generation beyond the 10nm Intel mentioned. That demonstrates the challenge in bringing this technology to an economic level. However, what really concerns me is now the entire industry is betting on the success of one company ASML/Cymer. I can't remember a time in the history of this industry that so much relied on one technology and one company. And even with EUV, we are likely to hit other physical limits at or just beyond th 5nm limitation. Gordon Moore has predicted the end of his own law three times that I am aware of and the last time was rather recent. He may br right this time around.

resistion
User Rank
Author
Not enough time to catch up
resistion   7/12/2013 8:40:01 PM
NO RATINGS
This year at SPIE, the troubles with higher doses and higher numerical apertures were pointed out. The more advanced nodes are even harder for EUV to get in. Fortunately it was also revealed 10 nm multi-patterning may not need multiple optical immersion exposures.

Gomez061439
User Rank
Author
Still?
Gomez061439   7/15/2013 2:16:21 AM
NO RATINGS
Why this guys taking so much time to complete this, they should have done by now...you know once I have seen a guy who done with an <a href="http://www.aiglemed.com/mobility-aid/">Powered wheelchairs</a> project within a week.  

Diogenes53
User Rank
Author
EUV
Diogenes53   7/15/2013 11:26:10 AM
NO RATINGS
A comment was made above that EUV has been under development since 2006. I suggest readers google SXPL (soft x-ray projection lithography) and find papers in the early 1990s and even late 1980s.  Some marketing guy changed it's name from SXPL to EUV so it would sound more like DUV, but it didnt seem to change the wavelength.  X-ray lithography is just as challenging now as it was then, after huge expenditure of money and manpower. Mr. McGrath's title "a work in progress" is an understatement.  The interesting question is why.  It's not as if alternatives don't exist.

rick merritt
User Rank
Author
Moore's other law
rick merritt   7/15/2013 7:54:22 PM
NO RATINGS
It was about 1997 when I had my one (phone) interview with Gordon Moore.

He predicted at that time that before Moore's Law (i.e. CMOS scaling) ends it would slow down and get harder. He was right. He foresaw what is happening now.

The next decade of advances will come slower at higher costs.

Then...graphene? buckballs? whoknowswhat?

 

mcgrathdylan
User Rank
Author
Re: EUV
mcgrathdylan   7/15/2013 8:06:39 PM
NO RATINGS
There are alternatives. Immersion with multiple passes, direct write, and a few other technologies. But other than the multi-pass immersion, my understanding is that all of these other technologeis are also still in development. And each has its own limitations. My understanding from talking with people about this through the years is that most people that are involved in lithography see EUV as the best hope, even though the kidns are still being worked out (and probably will be being worked out for years).

resistion
User Rank
Author
Re: EUV
resistion   7/15/2013 9:31:53 PM
NO RATINGS
For many years EUV had fixed barriers to overcome, but now that higher resolution is required, EUV has new, harder challenges. Inevitably it will fade away like many other NGL candidates.

Page 1 / 3   >   >>


Radio
NEXT UPCOMING BROADCAST

Drones are, in essence, flying autonomous vehicles. Pros and cons surrounding drones today might well foreshadow the debate over the development of self-driving cars. In the context of a strongly regulated aviation industry, "self-flying" drones pose a fresh challenge. How safe is it to fly drones in different environments? Should drones be required for visual line of sight – as are piloted airplanes? Join EE Times' Junko Yoshida as she moderates a panel of drone experts.

Brought to you by

July 16, 1pm EDT Thursday
IoT Network Shoot Out
Top Comments of the Week
Flash Poll
Like Us on Facebook

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
Special Video Section
LED lighting is an important feature in today’s and future ...
Active balancing of series connected battery stacks exists ...
After a four-year absence, Infineon returns to Mobile World ...
A laptop’s 65-watt adapter can be made 6 times smaller and ...
An industry network should have device and data security at ...
The LTC2975 is a four-channel PMBus Power System Manager ...
In this video, a new high speed CMOS output comparator ...
The LT8640 is a 42V, 5A synchronous step-down regulator ...
The LTC2000 high-speed DAC has low noise and excellent ...
How do you protect the load and ensure output continues to ...
General-purpose DACs have applications in instrumentation, ...
Linear Technology demonstrates its latest measurement ...
10:29
Demos from Maxim Integrated at Electronica 2014 show ...
Bosch CEO Stefan Finkbeiner shows off latest combo and ...
STMicroelectronics demoed this simple gesture control ...
Keysight shows you what signals lurk in real-time at 510MHz ...
TE Connectivity's clear-plastic, full-size model car shows ...
Why culture makes Linear Tech a winner.
Recently formed Architects of Modern Power consortium ...
Specially modified Corvette C7 Stingray responds to ex Indy ...