how come no one is calling EUV program out on recent slip. ASML was suppose to ship like 5 80W source tools this year. Now that has been reduced to 1 and the new target for source power is 70W in 2014.
EUV has missed 10nm or 9nm what what ever you want to call the node in 2017 after 14/16
Directed self assembly has made rapid progress in the last few years. Since it looks like EUV will miss being implemented at the 10 nm node for leading edge companies like Intel, it's now looking like some sort of complimentary lithography scheme using DSA might be ready by the 7 or 5 nm nodes.
I nelgected to note IMEC's CTO told me in the last year one of the programs that got the most ramping up at IMEC was on direct self assembly which they now show in their road map as having a significant role at 5nm helping beyond what EUV can/cannot do.
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