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resistion
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CEO
Re: EUV slip
resistion   10/20/2013 12:18:20 PM
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You're right, just read this: http://m.seekingalpha.com/article/1748582

 

john-F
User Rank
Rookie
EUV slip
john-F   10/20/2013 11:17:24 AM
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how come no one is calling EUV program out on recent slip. ASML was suppose to ship like 5 80W source tools this year. Now that has been reduced to 1 and the new target for source power is 70W in 2014. EUV has missed 10nm or 9nm what what ever you want to call the node in 2017 after 14/16

resistion
User Rank
CEO
Single patterning ain't coming back
resistion   10/17/2013 8:23:09 AM
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1 saves
Even the EUV community is saying DP is necessary, DP cost has to come down.

michigan0
User Rank
Manager
IMEC's road map
michigan0   10/16/2013 5:59:21 PM
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Why dose IMEC roadmap include FDSOI at 14nm today if it will 

drop it beyond 14nm? FDSOI was invented by IBM over a 

decade ago, but still not manufacturable at any technology 

node yet, including FDSOI at 35 and 28nm. 28nm Bulk Si is in 

mass production  for several years by major semiconductor

 companies.

 

Ge or InGaAs replacement processes are extremely difficult to

 be implemented in FinFET manufacturing. I do not think such

 replacement processes are necessary to enhance

 FinFET performance. SKim



resistion
User Rank
CEO
Re: memory part
resistion   10/10/2013 10:11:01 AM
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Samsung (IMEC member) alone seems to have its own drive for STT-MRAM research with its Global MRAM Innovation program: http://www.samsung.com/global/business/semiconductor/news-events/mram#!

 

any1
User Rank
CEO
Re: DSA
any1   10/10/2013 9:16:09 AM
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Directed self assembly has made rapid progress in the last few years.  Since it looks like EUV will miss being implemented at the 10 nm node for leading edge companies like Intel, it's now looking like some sort of complimentary lithography scheme using DSA might be ready by the 7 or 5 nm nodes.

resistion
User Rank
CEO
Re: memory part
resistion   10/10/2013 4:56:48 AM
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Ok, I see 3D-SONOS, but STT still seems to be more all over the place. Of course worth looking at, but I think they're starting late.

rick merritt
User Rank
Author
DSA
rick merritt   10/10/2013 3:52:56 AM
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I nelgected to note IMEC's CTO told me in the last year one of the programs that got the most ramping up at IMEC was on direct self assembly which they now show in their road map as having a significant role at 5nm helping beyond what EUV can/cannot do.

rick merritt
User Rank
Author
Re: memory part
rick merritt   10/10/2013 3:51:26 AM
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@Resistion: I did not go into a welath of material An presented about flash including the move to 3-D structures. But that info is implicit in the two memory foils if you look closely.

rick merritt
User Rank
Author
Re: An's being generous to EUV
rick merritt   10/10/2013 3:50:13 AM
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Note: IMEC sees EUV helping reduce double and triple patterning at 7nm, too, but not eliminating it

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