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rick merritt
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Do you still believe in EUV?
rick merritt   2/25/2014 1:51:04 PM
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Looks like a case of Herculean efforts but modest progress to me.

resistion
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Re: Do you still believe in EUV?
resistion   2/25/2014 4:10:18 PM
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Just looking at the data it's not revived EUV hope but continuing reality.

JimMcGregor
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Re: Do you still believe in EUV?
JimMcGregor   2/25/2014 7:07:20 PM
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Rick, I would agree. The process is gaining in complexity and while EUV still holds potential, the feasibility of the technology remains in question.

resistion
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Re: Do you still believe in EUV?
resistion   2/25/2014 7:48:40 PM
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At SPIE 2008, TSMC published a paper which talked about shot noise for the different lithography technologies and its impact on CD uniformity. EUV already had trouble in this area at 30 nm, so for the 20 nm size applications, it would have a prohibitive impact on minimum dose requirements, as that would drive up the source power requirement many times beyond the currently already difficult-to-reach target level.

The paper title is "Influence of Shot Noise on CDU with DUV, EUV, and E-Beam"

yangcoloy
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Re: Do you still believe in EUV?
yangcoloy   2/26/2014 2:30:37 AM
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EUV feels like the old 157nm. However, as there is not an innovation like water immersion yet.

zewde yeraswork
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Re: Do you still believe in EUV?
zewde yeraswork   2/26/2014 9:32:15 AM
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EUV is an interesting avenue for making chips faster and smaller and dealing with the upcoming end to Moore's Law, but it's far from a sure thing that's true.

rick merritt
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7nm without EUV
rick merritt   2/26/2014 10:49:18 AM
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That was the title of a panel at the SPIE Litho conference in San Jose last nite: "7nm without EUV"

If anyone went, I'd love to hear a digest of what was said. In any case, what do you think are the viable options?

HankWalker
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193i + E-beam?
HankWalker   2/26/2014 12:59:55 PM
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What about 193i (or nanoimprint as used in disk drives) to form parallel lines and e-beam to cut them and form vias? TSMC has a Mapper prototype system. David Lam is targeting Multibeam for this purpose, rather than rastering a mask, since it has much relaxed overlay/resolution/writing speed requirements compared to rastering the whole wafer.

157 died since it was a lot of investment for relatively little gain in process capability. EUV may start to be in that position, unless it can demonstrate significant capability improvement or cost reduction at the time it would be inserted.

 

wilber_xbox
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Re: 7nm without EUV
wilber_xbox   2/26/2014 1:04:27 PM
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Rick, the only viable option right now is multi-patterning solution. Ofcourse the cost will be very high and the challenges immense but some top level executive would want to make it a marketing sucess.

wilber_xbox
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Re: Do you still believe in EUV?
wilber_xbox   2/26/2014 1:07:37 PM
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We should look beyound the lithography tool solutions. We should modify the design rule and make relatively simple chips. I think we have already missed the deadline on 7nm EUV with the current source power.

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