Embedded Systems Conference
Breaking News
User Rank
Re : MIT Research Looks to Extend Moore’s Law
Anand.Yaligar   2/28/2014 2:31:41 PM
Good to see that MIT research will help Moore's Law continue but the bigger question is when will the saturation happen. For how long we will be able to shrink the transistor size ?

User Rank
Re: Re : MIT Research Looks to Extend Moore’s Law
daleste   2/28/2014 8:09:09 PM
When transistors are on and you can count the electrons as they go by, we will be at the end.  At that point, something has to change radically.  Maybe photons instead of electrons.

rick merritt
User Rank
Can DSA save the day?
rick merritt   2/28/2014 6:26:20 PM
I've heard a bit about DSA from Imec last fall and it was big in the SPIE Litho proram this week. But when I asked people they said it was more of an additive helping technology rather than a significant replacement for something like EUV, so...

Can DSA save the day?

User Rank
Re: Can DSA save the day?
AZskibum   2/28/2014 8:25:33 PM
It's an interesting stopgap that postpones the end of the line for Moore's Law. That's incredibly valuable of course, but doesn't change the need to continue the search for the next device -- the successor to the MOS transistor.

User Rank
Re: Can DSA save the day?
resistion   3/2/2014 7:35:27 AM
DSA is like a more cost-effective multiple patterning method, particularly good for "more than double" patterning of memory arrays or generally gridded features, without using iterations of spacer deposition and etching. There is a more advanced DSA version even for square arrays of contact holes, using triblock (instead of diblock) copolymers. This one-step multiplication is also the same motivation behind the 3D vertical NAND scheme. If planar floating gate NAND wants to (or even could) keep on going, most likely DSA would be a prime patterning candidate. It conceivably could be cheaper than 3D vertical NAND, but we need undisclosed numbers to compare.

Now of course, like any wannabe technology, like EUV or 3D vertical NAND, there are a number of issues to clear out first. For DSA the key one is natural defectivity and non-uniformity. And besides that, the ability to align repeatably (to an edge). Also, is it too thin to be a reliable etch mask?


NASA's Orion Flight Software Production Systems Manager Darrel G. Raines joins Planet Analog Editor Steve Taranovich and Embedded.com Editor Max Maxfield to talk about embedded flight software used in Orion Spacecraft, part of NASA's Mars mission. Live radio show and live chat. Get your questions ready.
Brought to you by

Like Us on Facebook

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
Special Video Section
The LTC®4015 is a complete synchronous buck controller/ ...
The LTC®2983 measures a wide variety of temperature sensors ...
The LTC®3886 is a dual PolyPhase DC/DC synchronous ...
The LT®3042 is a high performance low dropout linear ...
Chwan-Jye Foo (C.J Foo), product marketing manager for ...
The LT®3752/LT3752-1 are current mode PWM controllers ...
LED lighting is an important feature in today’s and future ...
Active balancing of series connected battery stacks exists ...
After a four-year absence, Infineon returns to Mobile World ...
A laptop’s 65-watt adapter can be made 6 times smaller and ...
An industry network should have device and data security at ...
The LTC2975 is a four-channel PMBus Power System Manager ...
In this video, a new high speed CMOS output comparator ...
The LT8640 is a 42V, 5A synchronous step-down regulator ...
The LTC2000 high-speed DAC has low noise and excellent ...
How do you protect the load and ensure output continues to ...
General-purpose DACs have applications in instrumentation, ...
Linear Technology demonstrates its latest measurement ...
Demos from Maxim Integrated at Electronica 2014 show ...
Bosch CEO Stefan Finkbeiner shows off latest combo and ...