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rmaire
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ASML, IBM & EUV
rmaire   8/1/2014 12:43:27 PM
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Imagine that a few years ago HP announced it was developing a new ultra high resolution printer capable of printing 1500 pages an hour with resolution of 10K dots per inch resolution. 
Imagine that the printer has been delayed and plagued by technology development issues, with slow progress being made to the point where customers wonder if it will ever work.
 
Then one day HP and a major customer announce that they successfully ran 637 sheets of paper through the printer in an hour as proof that it was well on its way to being a working printer. 
 
However HP and the customer conveniently leave out the fact in their announcement that the the paper went through the new printer without anything ever being printed on the paper and the paper came out as blank as it went in. In fact some of the blank paper in the output tray was recycled back to the input tray to be run through the printer again coming out blank again.
 
No toner was used and nothing showed up on the paper yet HP claimed that the new printer achieved a new "milestone",  "watershed" break through rate of 637 pages an hour.
 
Would you as an investor or analyst view this as an honest and fair representation of progress on the part of HP and its customer or would you find this misleading ?
 
Well,  that is what happened with IBM and ASML.....


resistion
User Rank
CEO
Re: Intel has 10nm w/o EUV
resistion   7/31/2014 5:03:46 AM
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At 10 nm EUV doesn't have as easy opportunity as at 100 nm. The required upgrades (new mask, pellicle, high NA, resist) are weighed against multiple immersion exposures. So far not too many required overall. Beyond 10 nm has other uncertainties as well, including multiple EUV exposures.

wilber_xbox
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Manager
Re: Intel has 10nm w/o EUV
wilber_xbox   7/31/2014 4:29:16 AM
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introducting more masks and cut masks should drive the price per die so economically EUV will be much better IMO.

resistion
User Rank
CEO
Re: good news
resistion   7/31/2014 1:19:44 AM
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34 WPH is still below the previous 70 WPH target. 20 mJ/cm2 dose is also quite noisy below 20 nm.

resistion
User Rank
CEO
Re: Intel has 10nm w/o EUV
resistion   7/31/2014 1:12:19 AM
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I thought he was referring to Intel's 10 nm, otherwise the EUV requiring these would defeat the purpose.

rick merritt
User Rank
Author
Re: good news
rick merritt   7/30/2014 11:55:08 PM
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@resistion: 34 wafers/hour to be specific

rick merritt
User Rank
Author
Re: Intel has 10nm w/o EUV
rick merritt   7/30/2014 11:52:53 PM
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@Wilbur: I did not know to ask but I will request an IBM engineer jump on and answer.

resistion
User Rank
CEO
Re: Intel has 10nm w/o EUV
resistion   7/30/2014 4:41:19 PM
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They use "pitch quartering" for 15-22 nm half-pitch lines. There can be up to four additional "cut" exposures.

resistion
User Rank
CEO
Re: good news
resistion   7/30/2014 2:31:20 PM
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Besides light source power, EUV already has other resolution-limiting issues like shot noise and multilayer angular bandwidth. And it's still nowhere near 100 WPH.

wilber_xbox
User Rank
Manager
Re: Intel has 10nm w/o EUV
wilber_xbox   7/30/2014 2:20:10 PM
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Rick, is it using the existing methods such as unidirectional patterns, mask optimization and breaking the chip patterns into 2-3 masks etc or something more innovative.

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