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rick merritt
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Intel has 10nm w/o EUV
rick merritt   7/30/2014 1:48:11 PM
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This just in from Intel fellow Mark Bohr:

"Intel has a way to achieve good density and good cost-per-transistor on our 10 nm technology without the use of EUV. 

We are continuing to explore EUV and non-EUV options for our 7nm technology."

wilber_xbox
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good news
wilber_xbox   7/30/2014 2:16:01 PM
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This will for sure put some cheers on the face of semiconductor manufacturing industry as this will ultimately result in lower cost and complexicity. However, ASML has to go a long way to give more than 100wph that will make EUV truely production ready.

wilber_xbox
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Re: Intel has 10nm w/o EUV
wilber_xbox   7/30/2014 2:20:10 PM
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Rick, is it using the existing methods such as unidirectional patterns, mask optimization and breaking the chip patterns into 2-3 masks etc or something more innovative.

resistion
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Re: good news
resistion   7/30/2014 2:31:20 PM
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Besides light source power, EUV already has other resolution-limiting issues like shot noise and multilayer angular bandwidth. And it's still nowhere near 100 WPH.

resistion
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Re: Intel has 10nm w/o EUV
resistion   7/30/2014 4:41:19 PM
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They use "pitch quartering" for 15-22 nm half-pitch lines. There can be up to four additional "cut" exposures.

rick merritt
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Re: Intel has 10nm w/o EUV
rick merritt   7/30/2014 11:52:53 PM
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@Wilbur: I did not know to ask but I will request an IBM engineer jump on and answer.

rick merritt
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Re: good news
rick merritt   7/30/2014 11:55:08 PM
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@resistion: 34 wafers/hour to be specific

resistion
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Re: Intel has 10nm w/o EUV
resistion   7/31/2014 1:12:19 AM
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I thought he was referring to Intel's 10 nm, otherwise the EUV requiring these would defeat the purpose.

resistion
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Re: good news
resistion   7/31/2014 1:19:44 AM
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34 WPH is still below the previous 70 WPH target. 20 mJ/cm2 dose is also quite noisy below 20 nm.

wilber_xbox
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Re: Intel has 10nm w/o EUV
wilber_xbox   7/31/2014 4:29:16 AM
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introducting more masks and cut masks should drive the price per die so economically EUV will be much better IMO.

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