The direct consequence of these back-end process and front-end system level changes on the design flow should be obvious. First and foremost, there's more data — much more data. Finer process geometries and more functionality equate to orders of magnitude increase in data management needs.

For design tools this means the need to access just the data that's being modified, rather than the entire design, using direct access methods instead of sequential streams and files. Second, the physics are demanding tighter coupling amongst algorithms acting on the design data in processing and in analysis where concurrent trade-offs become mandatory.

For tool flows this means concurrent algorithms must share information interactively using direct access and shared memory techniques. This is a sophisticated EDA architecture challenge by itself for just one vendor alone.

However, the third effect is the need for integration of best-in-class algorithms from multiple vendors, supporting a mixture of proven mainstream and advanced leading-edge needs in addition to in-house specialized tool capabilities. In other words, the need for multi-vendor interoperability interface standards becomes even more paramount and more complex.

Three years ago, this vision was little more than a dream. An earlier Sematech had failed to succeed — a good set of standards was developed, but no implementation path was available. Yet leading semiconductor IDM customers still recognized the need to achieve tight tool integration. They formed the industry coalition now known as the OpenAccess Coalition, and chose to partner with a major EDA vendor to develop a reference code implementation to accompany a standard specification.

Not only must this interface support the full scope of IC design, but it would have to support future leading-edge technology requirements and use an advanced state-of-the-art software architecture. In addition, the code would have to be made available to the entire EDA community along with first-rate documentation to allow the broadest possible adoption. Many questions were raised in terms of its ability to succeed technically or in the marketplace.

Today, those questions have been answered at last. OpenAccess is proving itself to be both a technical and marketplace success and the momentum continues to build and grow. Nine of the leading semiconductor customers have already adopted OpenAccess as their backplane for advanced design flows, and many EDA vendors have endorsed OpenAccess and announced plans for tool support. A number of EDA vendors now offer commercially supported tools, and with the addition of Mentor Graphics to the Coalition, multiple IC design flows will be possible with second source capability.

Customers and EDA vendors alike now recognize the cost savings made possible by eliminating or reducing the need for costly redundant reintegration of tools and tool interfaces. Full educational material is available in the form of textbooks, CDs, face-to-face training, interactive web training, and self-paced electronic training. These training classes have been occurring around the world with many more planned over the next 6-12 months.

OpenAccess Developers Forum and OpenAccess Conference Events, now in their third year, enable people to learn from those who know it best and have already integrated OpenAccess technology, learning best practices and tips of making the most of this exciting new technology.

So, what is the next step? The answer to that question can be found from the hot topic at numerous conferences around the world — the need for connecting the world of design and manufacturing is becoming apparent as a necessity for 90 and 65 nanometer flows. Stayed tuned for a new coalition to address those concerns.

Steve Schulz is president of the Silicon Integration Initiative, which oversees OpenAccess.