In the survey conducted by Sematech (Austin, Texas), the adoption rate among photomask makers for the next-generation GDSII technology — dubbed the Open Artwork Systems Interchange Standard (Oasis) — is only at a mere 0.2 percent.

Strangely, the adoption rate for the GDSII file-format standard was 57 percent, according to the survey. The remaining portion was listed as "other," but the survey results did not elaborate. For years, all mask shops have and still use GDSII, it was noted.

But when it was first proposed in 2002, it looked like the Oasis layout format was a slam-dunk to replace the much more verbose GDSII format. Oasis has been slow going since then, but it is quietly picking up momentum, observers said.

Also in the survey, the bulk of photomasks produced in the industry are lagging-edge products. Some 57 percent of the total masks produced are 0.25-micron and above; only 8.3 percent are 90-nm and below, according to the survey.

Overall yields hit 94.8 percent in the photomask industry. In the various categories, yields for 6-inch masks were 93 percent, soft-phase shift masks were 74.1 percent and alternating phase-shift masks were only 59 percent, according to the survey.

Masks produced without OPC were 77 percent. The average data file was 2.7-GB and the average "prep time" was 9 hours, according to the survey.