MONTEREY, Calif.--During a technology conference here today, Japan's Nikon Corp. is expected to give a surprising update of its electron-beam projection lithography (EPL) project, claiming its first "prototype" tool will be delivered in June of 2003.
Nikon's first EPL tool is expected to be shipped to Semiconductor Leading Edge Technologies Inc. (Selete), aJapanese chip-making consortium, according to Nikon. Later today, the Japanese lithography giant is expected to disclose the details of its EPL project at the 6th International Forum on Semiconductor Technology (IFST) in Monterey. IFST is co-sponsored by International Sematech and Semiconductor Research Corp.
For some time, Nikon has been developing the EPL tool, dubbed the EB Stepper. Nikon is developing the platform, while IBM Corp. is devising the optics for the tool.
The prototype "tool was designed for 65-nm node process R&D," according to Nikon's presentation, which was obtained early by SBN. "Throughput is 7 wafers per hour on 300-mm substrates for non-complementary masks with 5 uJ/cm2 resists, 10 wafers per hour for contact holes."
EPL is initially geared for niche-oriented applications, but the technology is aimed for production at the 45-nm node. "EPL will be introduced to limited applications such as printing contact holes or dense gate patterns," the Nikon presentation says. "EPL technology will be matured to meet the production timing for 45-nm node."
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