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Dainippon Screen, Kobe Steel to develop fab systems for supercritical fluids
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Silicon Strategies


KYOTO, Japan --Kobe Steel Ltd. and Dainippon Screen Mfg. Co. Ltd. today announced a partnership to jointly develop next-generation semiconductor fabrication systems using supercritical fluid technology. Supercritical fluids have densities approaching liquids while possessing viscosities and diffusivity properties of gases, making them ideally suited for wafer cleaning and drying applications, said the two companies.

Dainippon Screen, based in Kyoto, is one of the world' top10 suppliers of chip-manufacturing gear and a leading producer of photolithography resist coat-and-develop equipment as well as a major producer of wafer-cleaning tools. Tokyo-based Kobe Steel supplies supercritical fluid process technology and high-pressure, contamination-free equipment.

The two Japanese companies said they plan to combine their expertise to co-develop and market new wafer fab systems using supercritical fluid technology in three areas:

  • "Super Critical C02" (known as SCC02) as a post-develop drying agent for sub-100-nm lithography;
  • Wafer cleaning using SCC02 enhanced with co-solvents;
  • and,
  • SCC02 in post-clean drying applications.

    Dainippon Screen and Kobe Steel said these types of supercritical fluid-based cleaning and drying systems will be needed within three years for mass production of ICs, based on device feature sizes less than 100 nm (0.10 micron).






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