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MII tips nano-imprint for 32-nm apps
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EE Times


SAN JOSE, Calif. -- At the SPIE Advanced Lithography conference here, Molecular Imprints Inc. (MII) has rolled out its latest nano-imprint lithography tool for semiconductor applications.

The Imprio 300 from MII (Austin, Texas) claims to be the industry's highest resolution and lowest cost-of- ownership patterning solution for IC prototyping and process development at the 32-nm node and beyond. Based on its so-called ''Step and Flash Imprint Lithography'' technology, the tool is said to offer sub-10-nm resolution patterning in a single exposure using a simplified design and process.

Compared to MII's previous-generation Imprio 250 system, throughput on the Imprio 300 has been increased by 250 percent. Overlay performance has been improved with the ability to provide sub-10-nm overlay in test devices.

"The Imprio 300 system is an important step forward in our ongoing strategy to provide a comprehensive manufacturing solution to meet the semiconductor industry's critical patterning needs at the 32-nm node and beyond," said Mark Melliar-Smith, CEO of MII, in a statement.

Shipments of the Imprio 300 are expected to begin midway through 2008.



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