The AHM family of films has demonstrated die yield improvements as much as 7 percent--when coupled with Novellus' integrated edge bevel removal (EBR) technology, according to the San Jose-based fab tool maker.

Novellus' Vector PECVD platform features an integrated EBR capability that provides complete removal of the AHM film within a 1-mm transition zone. This sharp transition ensures that edge die have the required AHM thickness necessary for CD uniformity control within 2-mm from the wafer's edge.

"Novellus' AHM films meet the high-density, high-aspect ratio patterning requirements necessary for sub-32-nm devices," said Kevin Jennings, senior vice president for Novellus' PECVD business unit, in a statement. "Coupled with the proven productivity of the Vector platform, Novellus' AHM solution is the low cost, high volume manufacturing choice for these advanced optical films."