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Sharp touts wastewater treatment for fabs
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EE Times


WASHINGTON — Sharp Corp. said it has developed a method for treating semiconductor plant wastewater that combines its own microorganism treatment technique with nanotechnology.

Sharp claims the hybrid approach can reduce nitrogen content in chip plant wastewater by 90 percent and produces no sludge.

The technique utilizes Sharp's proprietary treatment technique with micro-nano-bubble technology. Together, the method eliminates 90 percent of nitrogen in wastewater without diluting, Sharp said. Nitrogen discharges from industrial plants and agriculture are linked to algae blooms in bodies of water.

Sharp also said the sludge-free technique cuts the production of solid wastes.

The Japanese company, which has installed a variety of environmental technologies at its manufacturing facilities, said it would conduct demonstrations and install the wastewater technique in its manufacturing plants.






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