Chromeless phase lithography stands somewhere between the space occupied by embedded attenuated phase-shift masks and the much more expensive alternating PSMs. CPL is somewhat of a misnomer, however, because the latest iteration of the technology does leave chrome on the mask.

CPL offers several advantages over the alternating phase-shift masks (altPSMs) that have been used thus far at Intel Corp., Motorola Inc. and elsewhere to define the most critical layers, including the gate polysilicon formation.

Alternating PSMs require a dual-exposure approach, with an initial exposure through the altPSM and a second exposure through a trim mask to remove residual, phase-edge images. That double exposure can cut throughput on the factory floor by as much as 40 percent, according to Motorola, which is testing a CPL mask now for a PowerPC microprocessor.

AltPSMs are also difficult to make, requiring etching steps that often raise costs, said Ken Rygler, an Austin-based consultant who worked earlier at DuPont Photomasks here. CPL masks use materials similar to those employed to make the relatively inexpensive attenuated PSMs.

"I think CPL is going to be cheaper than alternating, because you don't have to do the etching into the glass that is so time-consuming," Rygler said.

The nonexclusive alliance combines Photronics' (Brookfield, Conn.) commercial mask-making skills with ASML's CPL expertise and software, including its MaskWeaver mask optimization software and LithoCruiser lithography optimization tool.

Dinesh Bettadapur, president of ASML MaskTools (Santa Clara, Calif.), said that for 65-nm design rules and beyond, CPL masks may allow 193-nm scanners to be used for critical layers like gate definition and contacts in the interconnect stack.

"This agreement with Photronics is being driven by a customer that uses Photronics as a key mask supplier," Bettadapur said. The companies did not identify the customer.

United Microelectronics Corp. recently issued a news release saying that it intends to use CPL masks for its foundry customers. Canon Inc. has discussed its Vortex approach to chromeless phase lithography, and Dai Nippon Printing (Tokyo), one of the four largest mask houses in the world, is working on the technology. Dai Nippon, DuPont Photomasks, Hoya Glass and Photronics are the dominant mask companies now, Rygler said.

"Ultimately, the industry will need EUV [extreme-ultraviolet] lithography. But if we can use clever reticle-enhancement techniques and immersion, the hope is that we can extend 193-nm lithography and save on costs," said Bernie Roman, director of advanced lithography research at Motorola's advanced products research and development laboratory here.

Designing with CPL technology "is not for kids," however, said Austin-based entrepreneur John Petersen. "Even very smart guys don't have a clue about how to take advantage of CPL. The design tools need to get institutionalized. Right now, ASML MaskTools has far and away the best software for CPL, but it needs to move out to the Mentor and Synopsys kind of companies in order to see widespread use."