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EUV Milestones, Challenges Ahead

Vivek Bakshi
2/13/2018 00:01 AM EST

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resistion
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Re: EUVL - Coming to a FAB near you!
resistion   2/14/2018 3:55:37 PM
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The facts are the issues we allude to but the timelines for resolution (which are still in the future) are the different opinions.

Vivek Bakshi
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EUVL - Coming to a FAB near you!
Vivek Bakshi   2/14/2018 12:07:59 PM
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As Daniel Patrick Moynihan said "Everyone is entitled to their own opinion but not their own facts."  Facts in public domain are pointing to EUVL's readiness for some time and a leading chipmaker has announced that they will start using it this year. Even some critics who until recently swore that  EUVL will never work now say "it will be probably used next year." A leading lithography technology will always have a list of topics that needs to be developed as it needs further tuning to support next node per Moore's law. If it does not have list of challenges, it is a mature and not a leading technology. Moore's Law lives on and EUVL is a success! Congratulations to all those who worked hard, invested and believed in EUV. I predict that critics will continue to say even through next year that EUV does not work while using devices powered by EUV enabled leading edge computer chips. Cheers everyone!  

resistion
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Re: Unusable
resistion   2/14/2018 1:58:54 AM
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I'm aware hole layers have been targeted for likely first use, not sure if it will be smooth sailing without some impractical restrictions.

IanD
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Re: Unusable
IanD   2/14/2018 1:45:44 AM
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Except maybe for restricted use (e.g. vias/contacts) where lack of working pellicles/inspection tools/long cycle times are less of a problem than triple/quad patterning...

resistion
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Unusable
resistion   2/13/2018 10:04:14 AM
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The long list of challenges and issues make it unusable this year and probably next year as well.

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