Japanese researchers have developed what they claim is a time-saving, low-cost technique for producing organic photonic crystal lasers.
The technique, developed by a team from NTT's Basic Research Laboratory (BRL), enables a photonic crystal laser structure to be produced with only one step. The company uses a technique called direct nanoprinting. The patterned mask is pressed on an amorphous organic layer on the substrate. The transferred pattern acts as a photonic crystal laser.
The mask used is made of a silicon carbide (SiC) mould and it has 60 to 1000nm pitches. To fabricate the mask, standard nano-
fabrication techniques like electron beam lithography, lift-off and dry etching are used.
Dr Yuichi Harada, senior manager at the BRL, planning division, says the biggest advantage of the technique is a reduction in fabrication cost.
He adds that the study of photonic crystal lasers is just beginning: "We need more study to clarify its operation and characteristics of the emitted light."
The team's next steps will include the fabrication of various functional photonic crystal devices using the direct nanoprinting technique.
"We believe that the combination of the direct nanoprinting and organic materials makes various possibilities to study many functional photonic crystal devices," said Dr Harada.
"Direct nanoprinting can apply to any organic materials and they have many functions, such as non-linear optical properties and electron transfers. Using this technique, we can study many functional photonic crystal devices easily and cheaply."
As far as Dr Harada is aware, there are no other groups that apply the nanoprinting technology for fabricating the photonic crystal structure.
The team presented its results at the annual spring meeting of
the Japanese Society of Applied Physics.