LONDON Photomask vendor Photronics has said it will host a seminar on nano-imprint lithography during the Micro- and Nanoengineering Conference in Vienna, Austria, on Sept. 21.
Researchers from STMicroelectronics, Laboratoire des Technologies de la Microelectronique - CNRS, Leica and Photronics are due to present their outlooks on a number of technologies for process nodes at and beyond 45 nanometers. The topics include: nano-imprint lithography applications, process development, metrology, electron-beam lithography for template fabrication, template infrastructure development, and reticle enhancement technology (RET) options.
“We have initiated a series of technology seminars within the lithography community to share accomplishments and concerns surrounding the future of mask technology and its applications. As a critical enabling technology in the successful adoption of nano-imprint lithography (NIL), Photronics is committed to taking a leadership role in cultivating the necessary template infrastructure required for NIL to realize its full potential,” said Christopher Progler, chief technology officer of Photronics (Brookfield, Connecticut).
Photronics began its development of nano-imprint templates in 2002 as an extension of its development efforts in Chromeless Phase Lithography (CPL) masks, Alternating Aperture Phase Shift Masks (AAPSMs) and phase masks for photonics applications.
In May 2004, Photronics was selected as the template technology development partner in a $36 million U.S. government sponsored program under the National Institute of Standards and Technology – Advanced Technology Program (NIST ATP). Other participants in the program include Molecular Imprints, KLA-Tencor, Motorola Labs and the University of Texas at Austin.