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me3
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re: Lithography roadmap offers questions and openings
me3   7/16/2010 7:08:51 PM
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While Intel marches on and on and on with a few fully depreciated steppers ..... Why the genius at GF doesn't notice? And they just separated design from manufacturing.

jokosa
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re: Lithography roadmap offers questions and openings
jokosa   7/16/2010 6:46:40 PM
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Whatever happened to interferometry nodes? I have not heard of them for 10 years, but coupled with todays spacial patterning it seems like an idea ready for more research...

resistion
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re: Lithography roadmap offers questions and openings
resistion   7/16/2010 4:38:04 PM
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The replication part is great but beam conditions drift which can cause overlay problems or other defects given enough time. Maybe multibeam + imprint is the answer?

walken1
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re: Lithography roadmap offers questions and openings
walken1   7/16/2010 3:21:30 PM
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If memory serves me correctly, the master imprint mask is written with an e-beam writer, but the replica masks are produced using the same nanoimprint process used for IC production -- the master mask imprints the replica masks. So e-beam write times shouldn't be a major factor.

FChen
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re: Lithography roadmap offers questions and openings
FChen   7/16/2010 12:05:55 PM
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I'd imagine if EUV tools were available in 2011-2012, some companies would still be able to skip immersion and double patterning entirely, catching up to those who bought EUV, and immersion, and double patterning. The dragging out of 193 nm technology has enabled leaders to keep their lead.

resistion
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re: Lithography roadmap offers questions and openings
resistion   7/16/2010 7:42:40 AM
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Mind the ebeam write time for those imprint masks!

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