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resistion
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re: IMEC announces directed self-assembly process line
resistion   2/10/2012 2:54:32 PM
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As I understand, each pitch/duty cycle combination is a different formulation, so how many does one need to keep in store?

goafrit
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re: IMEC announces directed self-assembly process line
goafrit   2/10/2012 3:27:26 PM
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This company is doing well in most of their medical products, I am surprised they are taking this path. It is far better to outsource some of these than developing them in-house.

any1
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re: IMEC announces directed self-assembly process line
any1   2/10/2012 9:14:54 PM
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Good question @resistion - I don't know, but I think for critical levels of something like a memory device with repeating cells at minimum pitch not very many. You would likely be limited to Tela on-grid type layout rules for the device.

krisi
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re: IMEC announces directed self-assembly process line
krisi   2/12/2012 4:07:50 PM
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Any idea how expensive is this approach? There must be lots of repairs required...Kris

double-o-nothing
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re: IMEC announces directed self-assembly process line
double-o-nothing   2/13/2012 5:33:37 AM
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If the edge is off, it could cause more problems.

double-o-nothing
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re: IMEC announces directed self-assembly process line
double-o-nothing   2/20/2012 9:01:53 AM
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The PS-PMMA system is targeted for 20 +/-5 nm hp. Each BCP system is only a single node solution.

FChen
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re: IMEC announces directed self-assembly process line
FChen   2/20/2012 2:00:35 PM
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At what edge separations do the lamellae start getting confused and become like spaghetti? Typically a distance of several lamellae?

double-o-nothing
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re: IMEC announces directed self-assembly process line
double-o-nothing   2/24/2012 7:19:05 AM
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If I have a trench filled with 4 lines and 5 spaces, and then I decrease the trench width 10%, gonna get defects.



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