REGISTER | LOGIN
Breaking News
Comments
Newest First | Oldest First | Threaded View
Page 1 / 2   >   >>
Jason_Liu
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
Jason_Liu   2/19/2012 7:14:17 AM
NO RATINGS
Perhaps, regarding as the viewpoint of mass-production, the approach to improve the common DOF of the different characteristics of pattern,ex. iso- vs. dense- ,or line vs. space, is more practical and economic than that to put all resource to enhance the resolution.

Diogenes53
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:16:20 AM
NO RATINGS
The dream of e-beam direct write has been around as long as x-ray lithography, and just as successful. The e-beam problems of throughput, data management and error correction simply cannot be solved in time, or economically. EUV, or, more correctly, soft x-ray projection lithography, continues to suffer from very x-ray like problems of decades ago. The only technology with the potential to complement optical lithography is imprint, which essentially is optical lithography: it uses an I-line source, I-line resists, and quartz based photomasks. Defects are a more manageable challenge than those facing EBDW and SXPL (EUV), particularly in memory. Lithography will bifurcate into solutions for logic and solutions for memory.

Diogenes53
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:07:26 AM
NO RATINGS
H

rick merritt
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
rick merritt   2/18/2012 2:13:45 AM
NO RATINGS
I wonder if the co-existance of several litho techs will make the economics tougher (lower volumes for all).

resistion
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
resistion   2/18/2012 12:54:17 AM
NO RATINGS
E-beam is more mature than optical for sure. But electrons, primary, photo-, or secondary, are prone to random disturbance. And they go into the substrate. So the interest in DSA, though it seems sensitive to the guiding pattern size.

ebmfuser
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
ebmfuser   2/17/2012 11:06:42 PM
NO RATINGS
AND, the cost savings in masks alone would be enormous!!!

ebmfuser
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
ebmfuser   2/17/2012 11:04:02 PM
NO RATINGS
Truly a shame that more 'professionals' don't look more seriously at e-beam lithography themselves, and not take the word of people in the photomask industry, who would directly be threatened if mask-less lithography came into popularity. E-beam litho has demonstrated nano-level capability for more than 20 years, with comparative overlay capability equaling the best aligners out there. Yes, throughput is an issue, but at 1/6 (or less) the cost of an good immersion stepper, you can buy several!!! Truth is that even the finest nano-imprint tool or EUV stepper will require masks, and they will only be available via e-beam lithography (as well as being ridiculously expensive and short lived). Direct write is a viable technology - today!

resistion
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 9:18:37 AM
NO RATINGS
The critical layer tools need to be double or higher throughput, along with the track.

resistion
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 6:33:17 AM
NO RATINGS
I think we can only count 10 nm and 7 nm, then what..and that would not be single patterning anymore either. CD variations on the order of lattice constants.

resistion
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 6:19:31 AM
NO RATINGS
EUV doesn't have so many nodes left. Unless you mean to include the next wavelength.

Page 1 / 2   >   >>


Most Recent Comments
rick merritt
 
Tim R Johnson
 
ewertz
 
antedeluvian
 
ewertz
 
perl_geek
 
R_Colin_Johnson
 
perl_geek
 
R_Colin_Johnson
Most Recent Messages
11/19/2017
3:31:42 PM
Like Us on Facebook
EE Life
Frankenstein's Fix, Teardowns, Sideshows, Design Contests, Reader Content & More
Martin Rowe

Test Tool Finds Ethernet Wiring Errors
Martin Rowe
Post a comment
When my house was renovated several years ago, I had the electrician install network outlets in numerous places, then run the LAN cables to a wiring closet. But he didn't document the ends ...

Martin Rowe

Local Electronics Store Supplies Engineers and Hobbyists
Martin Rowe
5 comments
Rochester, N.Y. — Tucked away in this western New York city known for its optics is Goldcrest Electronics, a local store that's supplied businesses and individuals with electronic ...

Martin Rowe

How to Transform a Technology University (Book Review)
Martin Rowe
1 Comment
The Presiding Genius of the Place by Alison Chisolm. WPI, Worcester, Mass., 234 pp., 2016. Engineers love to discuss, and often criticize, engineering education. They often claim ...

Max Maxfield

Aloha from EEWeb
Max Maxfield
Post a comment
Just a few minutes ago as I pen these words, I posted this blog about this month's Cartoon Punchline Competition over on EEWeb.com.