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resistion
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Re: Forgot about masks, stochastics and EPE
resistion   4/21/2017 11:43:44 AM
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If it were really working the issues, it wouldn't be making these obviously stock-driven misleading announcements.

rick merritt
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Re: Forgot about masks, stochastics and EPE
rick merritt   4/21/2017 11:36:49 AM
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My impression is ASML is not dodging so much as working the issues. There are many of them and I have seen ASML and others catalog them pretty thoroughly in several presentations.

My view is there should be a book written about EUV as one of the most demanding engineering efforts ever--whether the end product becomes a major booster for chip making or not.

resistion
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Re: Forgot about masks, stochastics and EPE
resistion   4/20/2017 10:38:08 AM
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ASML continues to dodge the issues as long as people let them.

rick merritt
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New customers
rick merritt   4/20/2017 10:21:50 AM
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I'm guessing the fifth and sixth customers this year may be Micron, SKhynix or a more distant third UMC.

double-o-nothing
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Forgot about masks, stochastics and EPE
double-o-nothing   4/20/2017 8:45:43 AM
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There are plenty of roadblocks, such as the mask manufacturing and inspection, stochastics and EPE (from shadowing). The assumed doses don't match the resists being tested. Even 40 nm features are shifted from their designated place on the mask.

resistion
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Re: insufficient volume
resistion   4/20/2017 6:30:24 AM
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About as meaningful as ebeam writers to me.

Violoncelles
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Re: insufficient volume
Violoncelles   4/20/2017 6:04:29 AM
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This is a good start and when they avoid double or triple patterning , it is meaningful.

resistion
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insufficient volume
resistion   4/20/2017 4:42:05 AM
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There are not enough tools to do anything meaningful. In Q4 2016 and Q1 2017, 35 immersion tools were sold, this is more than the booklog and field EUV tools combined. And this adds to the already hundreds of immersion tools in the field. And we know EUV tools are slower. They can't be used on enough layers to make an impact.



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