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natashawilliamss1987
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Re: Dose
natashawilliamss1987   2/9/2018 1:29:46 AM
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Informative

resistion
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Re: Dose
resistion   1/18/2018 7:48:54 PM
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It was 32x21 on 53 nm pitch nominally though they also showed the other results you mentioned. The emphasis was reducing the LCDU but nano failures were also pointed out.

ScottenJ
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Re: Dose
ScottenJ   1/18/2018 7:10:54 PM
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At what pitch? imec has been showing 32nm pitch lines and spaces at ~20Mj/cm2 for a long time including at their technology forum at IEDM in December, and 36nm pitch contacts at ~30mJ/cm2. Regardless of what you think imec can do, the lithographers responsible for running EUV in production are telling me 30mJ/cm2 at 7nm. This is multiple lithographers at multiple companies that have EUV tools. These are people with access to all kinds of unpublished results.

ScottenJ
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Re: Dose
ScottenJ   1/18/2018 7:10:50 PM
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At what pitch? imec has been showing 32nm pitch lines and spaces at ~20Mj/cm2 for a long time including at their technology forum at IEDM in December, and 36nm pitch contacts at ~30mJ/cm2. Regardless of what you think imec can do, the lithographers responsible for running EUV in production are telling me 30mJ/cm2 at 7nm. This is multiple lithographers at multiple companies that have EUV tools. These are people with access to all kinds of unpublished results.

ScottenJ
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Re: Dose
ScottenJ   1/18/2018 7:10:47 PM
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At what pitch? imec has been showing 32nm pitch lines and spaces at ~20Mj/cm2 for a long time including at their technology forum at IEDM in December, and 36nm pitch contacts at ~30mJ/cm2. Regardless of what you think imec can do, the lithographers responsible for running EUV in production are telling me 30mJ/cm2 at 7nm. This is multiple lithographers at multiple companies that have EUV tools. These are people with access to all kinds of unpublished results.

resistion
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Re: Dose
resistion   1/18/2018 3:43:33 PM
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The report was from Semicon Europa two months ago.

rick merritt
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Re: Dose
rick merritt   1/18/2018 12:21:13 PM
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I updated the story, thx!

ScottenJ
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Re: Dose
ScottenJ   1/18/2018 11:27:57 AM
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I have a lot of respect for imec and the work they do, but they are an R&D organization and once a technology moves towards commercialization their partners take over. The 30mj/cm2 number I used comes from multiple interviews with the lithographers preparing for production inside the companies that will be running EUV.

There is also typically a delay between what imec has achieved and what they have published and they have published 20mJ/cm2 line/spaces with smoothing and 30mJ/cm2 contacts with smoothing.

resistion
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Re: Dose
resistion   1/18/2018 7:16:30 AM
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IMEC has been reporting 66 mJ/cm2 but their target is 30. http://www.semi.org/eu/sites/semi.org/files/events/presentations/03_Danilo%20DeSimone_IMEC.pdf But I do agree the EUV community is aware of the so-called "shot noise" issue. https://www.semiwiki.com/forum/f293/euv-shot-noise-impact-7nm-7993.html You can only make the resist so absorptive, then not enough photons reach the bottom. So the source power has to keep going up. 500W and even 1000W are the new targets.

ScottenJ
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Re: Dose
ScottenJ   1/18/2018 3:28:59 AM
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I don't expect any EUV wafers in 2018, I expect only optical 7nm wafers this year. EUV wafers start next year.

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